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Volumn 5, Issue 2, 2010, Pages 91-94

Cost-effective fabrication of nanoscale electrode memristors with reproducible electrical response

Author keywords

[No Author keywords available]

Indexed keywords

BASIC RESEARCH; COST-EFFECTIVE FABRICATION; ELECTRICAL CHARACTERISTIC; ELECTRICAL RESPONSE; FABRICATION METHOD; INFORMATION GAP; LATERAL DIMENSION; MICRO-FABRICATION TECHNIQUES; NANO SCALE; TECHNOLOGY PROGRESS;

EID: 77956257348     PISSN: None     EISSN: 17500443     Source Type: Journal    
DOI: 10.1049/mnl.2009.0106     Document Type: Article
Times cited : (12)

References (10)
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    • (2008) Nature , vol.453 , Issue.7191 , pp. 80-83
    • Strukov, D.B.1    Snider, G.S.2    Stewart, D.R.3    Williams, R.S.4
  • 3
    • 0015127532 scopus 로고
    • Memristor-the missing circuit element
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    • Chua, L.: ' Memristor-the missing circuit element ', IEEE Trans. Circuit Theory, 1971, 18, (5), p. 507-519 0018-9324
    • (1971) IEEE Trans. Circuit Theory , vol.18 , Issue.5 , pp. 507-519
    • Chua, L.1
  • 4
    • 0002007506 scopus 로고
    • Progress in digital integrated electronics
    • Moore, G.: ' Progress in digital integrated electronics ', Proc. IEEE Int. Electron Devices Meeting, 1975, p. 11-13, Washington, DC, USA
    • (1975) Proc. IEEE Int. Electron Devices Meeting , pp. 11-13
    • Moore, G.1
  • 5
    • 2942548117 scopus 로고    scopus 로고
    • Nonvolatile memory with multilevel switching: A basic model
    • article no. 178302, 40031-9007
    • Rozenberg, M.J., Inoue, I.H., and Sanchez, M.J.: ' Nonvolatile memory with multilevel switching: a basic model ', Phys. Rev. Lett., 2004, 92, (17), article no. 178302, 4pp. 0031-9007
    • (2004) Phys. Rev. Lett. , vol.92 , Issue.17
    • Rozenberg, M.J.1    Inoue, I.H.2    Sanchez, M.J.3
  • 6
    • 70249115683 scopus 로고    scopus 로고
    • Memristive model of amoeba learning
    • article no. 021926
    • Pershin, Y.V., La Fontaine, S., and Di Ventra, M.: ' Memristive model of amoeba learning ', Phys. Rev. E, 2009, 80, article no. 021926
    • (2009) Phys. Rev. e , vol.80
    • Pershin, Y.V.1    La Fontaine, S.2    Di Ventra, M.3
  • 7
    • 33645417245 scopus 로고    scopus 로고
    • Circuit fabrication at 17nm half-pitch by nanoimprint lithography
    • 1530-6984
    • Jung, G., Johnston-Halperin, E., Wu, W., Yu, Z., Wang, S., and Tong, W.M.: et al. ' Circuit fabrication at 17nm half-pitch by nanoimprint lithography ', Nano Lett., 2006, 6, (3), p. 351-354 1530-6984
    • (2006) Nano Lett. , vol.6 , Issue.3 , pp. 351-354
    • Jung, G.1    Johnston-Halperin, E.2    Wu, W.3    Yu, Z.4    Wang, S.5    Tong, W.M.6
  • 8
    • 77956249896 scopus 로고    scopus 로고
    • Fabrication of nanoscale memristor arrays with one nanoimprint lithography step
    • Marco Island, FL, USA, May
    • Xia, Q., Yang, J.J., Wu, W., Li, X., and Williams, R.S.: ' Fabrication of nanoscale memristor arrays with one nanoimprint lithography step ', Presented at Int. Conf. on EIPBN, Marco Island, FL, USA, May, 2009
    • (2009) Presented at Int. Conf. on EIPBN
    • Xia, Q.1    Yang, J.J.2    Wu, W.3    Li, X.4    Williams, R.S.5
  • 9
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    • Electrical and defect thermodynamic properties of nanocrystalline titanium dioxide
    • 0021-8979
    • Knauth, P., and Tuller, H.L.: ' Electrical and defect thermodynamic properties of nanocrystalline titanium dioxide ', J. Appl. Phys., 1999, 85, p. 897-902 0021-8979
    • (1999) J. Appl. Phys. , vol.85 , pp. 897-902
    • Knauth, P.1    Tuller, H.L.2
  • 10
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    • Offset masks for lift-off photoprocessing
    • 0003-6951
    • Dolan, G.: ' Offset masks for lift-off photoprocessing ', Appl. Phys. Lett., 1977, 31, (5), p. 337-339 0003-6951
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    • Dolan, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.