An open argon dielectric barrier discharge VUV-source

Plasma Processes and Polymers

Volumn 7, Issue 8, 2010, Pages 650-656

  Sobottka, Axel ^a   Drößler, Lutz ^a   Lenk, Martin ^a   Prager, Lutz ^a   Buchmeiser, Michael R ^b  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^b UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Argon; Coatings; Curing of polymers; Excimer; Functionalization of polymers

Indexed keywords

ATMOSPHERIC PRESSURE GLOW DISCHARGE; CONTINUOUS WAVE MODES; CURING OF POLYMERS; DIELECTRIC BARRIER DISCHARGES; DIELECTRIC DISCHARGES; EMISSION SPECTRUMS; EXCIMERS; FUNCTIONALIZATION OF POLYMERS; OPTIMUM DESIGNS; RADIATION SOURCE; RF GENERATORS; SURFACE MODIFICATION; TIME RESPONSE; VACUUM ULTRAVIOLETS;

ARGON; ATMOSPHERIC PRESSURE; CURING; EMISSION SPECTROSCOPY; FUNCTIONAL POLYMERS; GLOW DISCHARGES; OPEN SYSTEMS; PLASMA APPLICATIONS; PLASTIC COATINGS; QUANTUM OPTICS; RADIATION;

POLYMERS;

EID: 77956233158     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900145     Document Type: Article

References (21)

1. B. Eliasson, U. Kogelschatz, Appl. Phys. B 1988, 46, 299.
2. U. Kogelschatz, B. Eliasson, W. Egli, Pure Appl. Chem. 1999, 71, 1819.
3. U. Kogelschatz, Plasma Chem. Plasma Process. 2003, 23, 1.
4. U. Kogelschatz, APP Spring Meeting, Bad Honnef, 2001.
5. A. Holländer, J. E. Klemberg-Sapieha, M. R. Wertheimer, J. Polym. Sci. Polym. Chem. 1995, 33, 2013.
6. R. Schubert, F. Frost, M. Hinkefuß, R. Konieczny, B. Marquardt, R. Mehnert, M. R. Buchmeiser, Surf. Coat. Technol. 2009, 203, 3734.
7. R. Schubert, T. Scherzer, M. Hinkefuß, B. Marquardt, J. Vogel, M. R. Buchmeiser, Surf. Coat. Technol. 2009, 203, 1844.
8. L. Prager, A. Dierdorf, H. Liebe, S. Naumov, S. Stojanović, R. Heller, L. Wennrich, M. R. Buchmeiser, Chem. Eur. J. 2007, 13, 8522.
9. L. Prager, L. Wennrich, R. Heller, W. Knolle, S. Naumov, A. Prager, D. Decker, H. Liebe, M. R. Buchmeiser, Chem. Eur. J. 2009, 15, 675.
10. J. J. Yu, I. W. Boyd, Phys. Status Solidi A 2005, 202, R98.
11. J. J. Yu, I. I. Liaw, I. W. Boyd, Electron. Lett. 2005, 41, 1210.
12. K. Toshikawa, A. Yokotani, K. Kurosawa, Jpn. J. Appl. Phys. Part 1 2005, 44, 7785.
13. S. Y. Moon, W. Choe, B. K. Kang, Appl. Phys. Lett. 2004, 12, 188.
14. A. Chirokov, A. Gutsol, A. Fridman, K. D. Sieber, J. M. Grace, K. S. Robinson, Plasma Sources Sci. Technol. 2004, 13, 623.
15. J. J. Shi, D. W. Liu, M. G. Kong, Appl. Phys. Lett. 2006, 89, 081502.
16. J. L. Walsh, J. J. Shi, M. G. Kong, Appl. Phys. Lett. 2006, 89, 161505.
17. N. Balcon, A. Aanesland, R. Boswell, Plasma Sources Sci. Technol 2007, 16, 217.
18. C. Elsner, M. Lenk, L. Prager, R. Mehnert, Appl. Surf. Sci. 2006, 252, 3616.
19. U. Kogelschatz, H. Esrom, J.-Y. Zhang, I. W. Boyd, Appl. Surf. Sci. 2000, 168, 29.
20. Z. Laszlo, I. Ilisz, G. Peintler, A. Dombi, Ozone-Sci. Eng. 1998, 20, 421.
21. A. del Campo, E. Arzt, Chem. Rev. 2008, 108, 911.