Amorphous silicon film deposition from SiH4 by chemical vapor deposition with argon excimer lamp

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 11, 2005, Pages 7785-7788

  Toshikawa, Kiyohiko ^a,b   Yokotani, Atsushi ^a   Kurosawa, Kou ^a  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b Miyazaki Oki Electric Co Ltd   (Japan)

Author keywords

Amorphous silicon thin film; Argon excimer lamp; Monosilane; Photochemical vapor deposition; Vacuum ultraviolet

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; PHOTOCHEMICAL REACTIONS; PHOTONS; SILICON COMPOUNDS; THIN FILMS;

AMORPHOUS SILICON THIN FILM; SILICON FILM DEPOSITION;

AMORPHOUS SILICON;

EID: 31544438801     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.7785     Document Type: Article

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