Fast coating of ultramicroelectrodes with boron-doped nanocrystalline diamond

Diamond and Related Materials

Volumn 19, Issue 10, 2010, Pages 1330-1335

  Silva, E L ^a   Neto, M A ^a   Fernandes, A J S ^b   Bastos, A C ^a   Silva, R F ^a   Zheludkevich, M L ^a   Oliveira, F J ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

Boron doping; Electroanalysis; Nanocrystalline diamond; Ultramicroelectrodes

Indexed keywords

ARGON GAS; BORON CONTENT; BORON-DOPED; BORON-DOPING; CONDUCTIVE DIAMONDS; CVD METHOD; DOPING AGENT; ELECTROANALYSIS; ELECTROCHEMICAL ANALYSIS; ELECTROCHEMICAL WINDOW; FAST COATING; GAS-FLOW RATIO; HIGH STABILITY; HOT FILAMENT; LOW BACKGROUND; NACL SOLUTION; NANOCRYSTALLINE DIAMONDS; SUBSTRATE TEMPERATURE; SYSTEM PRESSURE; TUNGSTEN TIP; TUNGSTEN WIRES; ULTRA MICROELECTRODES;

ARGON; BORON; CHEMICAL STABILITY; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; CYCLIC VOLTAMMETRY; DIAMONDS; DOPING (ADDITIVES); EPOXY RESINS; ETHANOL; FILAMENTS (LAMP); FILM GROWTH; FLOW OF GASES; MICROELECTRODES; RESINS; SODIUM CHLORIDE; TUNGSTEN;

DIAMOND FILMS;

EID: 77956060942     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.06.023     Document Type: Article

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