Characteristics of indium zinc oxide films deposited using the facing targets sputtering method for OLEDs applications

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6223-6227

  Rim, Y S ^a   Kim, H J ^a   Kim, K H ^b  

^a Yonsei University   (South Korea)

^b Gachon University   (South Korea)

Author keywords

Flexible substrate; FTS; IZO; OLEDs

Indexed keywords

DEPOSITION CONDITIONS; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; FACING TARGETS SPUTTERING; FLEXIBLE SUBSTRATE; FTS; GLASS SUBSTRATES; INDIUM ZINC OXIDES; INDIUM-ZINC-OXIDE FILMS; IZO; OLEDS; ORGANIC LIGHT-EMITTING DEVICES; POLYETHERSULFONES; SPUTTERING PARAMETERS;

AMORPHOUS FILMS; ELECTRIC PROPERTIES; GLASS; INDIUM; SUBSTRATES; THIN FILMS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 77956056391     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.169     Document Type: Conference Paper

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