Fabrication of high precision X-ray mask for X-ray grating of X-ray Talbot interferometer

Microsystem Technologies

Volumn 16, Issue 8-9, 2010, Pages 1309-1313

  Noda, Daiji ^a   Tsujii, Hiroshi ^a   Takahashi, Naoki ^a   Hattori, Tadashi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING PROCESS; EFFECTIVE AREA; FABRICATED STRUCTURES; HIGH ASPECT RATIO; HIGH PRECISION; MEDICAL DIAGNOSIS; NON DESTRUCTIVE INSPECTION; PHASE TOMOGRAPHY; TALBOT INTERFEROMETER; ULTRAVIOLET LITHOGRAPHY; X RAY MASK; X-RAY GRATINGS; X-RAY PHASE; XRAY IMAGING;

ASPECT RATIO; DIAGNOSIS; DRY ETCHING; INTERFEROMETERS; MASKS; MEDICAL IMAGING; PLASMA ETCHING; TOMOGRAPHY; X RAY DIFFRACTION; X RAY LITHOGRAPHY;

X RAYS;

EID: 77955851135     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-010-1085-x     Document Type: Conference Paper

References (10)

1. David C, Nöhammer B, Solak HH, Ziegler E (2002) Appl Phys Lett 81:3287-3289
2. Matsumoto M, Takiguchi K, Tanaka M, Funabiki Y, Takeda H, Momose A, Utsumi Y, Hattori T (2007) Microsyst Technol 13:543-546
3. Momose A (2005) Jpn J Appl Phys 44:6355-6367
4. Momose A, Kawamoto S, Koyama I, Hamaishi Y, Takai K, Suzuki Y (2003) Jpn J Appl Phys 42:L866-L868
5. Momose A, Yashiro W, Moritake M, Takeda Y, Uesugi K, Takeuchi A, Suzuki Y, Tanaka M, Hattori T (2006) Proceedings of the Society of Photo-Optical Instrumentation Engineers 6318: 63180T1-63180T10
6. Noda D, Tanaka M, Shimada K, Hattori T (2007) Jpn J Appl Phys 46:849-851
7. Noda D, Tanaka M, Shimada K, Yashiro W, Momose A, Hattori T (2008) Microsyst Technol 14:1311-1315
8. Pfeiffer F, Weitkamp T, Bunk O, David C (2006) Nat Phys 2:258-261
9. Tsujii H, Shimada K, Tanaka M, Yashiro W, Noda D, Hattori T (2008) J Adv Mech Des Syst Manuf 2:246-251
10. Utsumi Y, Kishimoto T, Hattori T, Hara H (2007) Microsyst Technol 13:417-423