Fabrication of diffraction grating with high aspect ratio using X-ray lithography technique for X-ray phase imaging

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 2, 2007, Pages 849-851

  Noda, Daiji ^a   Tanaka, Makoto ^a   Shimada, Kazuma ^a   Hattori, Tadashi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Diffraction grating; Electroplating; High aspect ratio; X ray lithography; X ray phase imaging

Indexed keywords

ASPECT RATIO; ELECTROPLATING; X RAY LITHOGRAPHY;

HIGH ASPECT RATIO; PHASESENSITIVE IMAGING METHODS; X RAY PHASE IMAGING; X RAY TALBOT INTERFEROMETRY;

DIFFRACTION GRATINGS;

DIFFRACTION; ELECTROPLATING; LITHOGRAPHY;

EID: 34547902908     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.849     Document Type: Article

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