Large area and wide dimensions X-ray lithography using energy variable synchrotron radiation

Microsystem Technologies

Volumn 13, Issue 5-6, 2007, Pages 417-423

  Utsumi, Yuichi ^a   Kishimoto, Takefumi ^a   Hattori, Tadashi ^a   Hara, Hirotsugu ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOYAMA Corporation   (Japan)

Author keywords

LIGA; MEMS; Synchrotron radiation; X ray lithography

Indexed keywords

ASPECT RATIO; GRAPHITE; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; PATTERN RECOGNITION; SYNCHROTRON RADIATION; X RAYS;

ENERGY REGIONS; HIGH ASPECT RATIO PATTERNING; PATTERN THICKNESS;

X RAY LITHOGRAPHY;

EID: 33847245325     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0238-4     Document Type: Article

References (9)

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