Strongly Superhydrophobic Silicon Nanowires by Supercritical CO2 Drying

Electronic Materials Letters

Volumn 6, Issue 2, 2010, Pages 59-64

  Choi, Chulmin ^a   Yoon, Yeoungchin ^a   Hong, Daehoon ^a   Brammer, Karla S ^a   Noh, Kunbae ^a   Oh, Young ^a   Oh, Seunghan ^b   Talke, Frank E ^a   Jin, Sungho ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Wonkwang University   (South Korea)

Author keywords

Contact angle; Electroless etching; Silicon nanowires; Superhydrophobic surface

Indexed keywords

DRYING PROCESS; ELECTROLESS ETCHINGS; HYDROPHOBIC COATINGS; MICRO-PIPETTE; NANO-SCALE SURFACE ROUGHNESS; SILICON NANOWIRES; SUPER-HYDROPHILIC; SUPER-HYDROPHOBIC SURFACES; SUPERCRITICAL CO; SUPERHYDROPHOBIC; SUPERHYDROPHOBIC BEHAVIOR; SUPERHYDROPHOBIC STATE; TRICHLOROSILANES; VACUUM SUCTION; VERTICALLY ALIGNED; WATER DROPLETS; ZERO CONTACT ANGLE;

AGGLOMERATION; ANGLE MEASUREMENT; CONTACT ANGLE; DROP FORMATION; DRYING; ETCHING; NANOWIRES; SURFACE PROPERTIES; SURFACE ROUGHNESS;

HYDROPHOBICITY;

EID: 77955767640     PISSN: 17388090     EISSN: None     Source Type: Journal    
DOI: 10.3365/eml.2010.06.059     Document Type: Article

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