Bright nickel film deposited by supercritical carbon dioxide emulsion using additive-free Watts bath

Electrochimica Acta

Volumn 55, Issue 22, 2010, Pages 6469-6475

  Chang, Tso Fu Mark ^a   Sone, Masato ^a   Shibata, Akinobu ^a   Ishiyama, Chiemi ^a   Higo, Yakichi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Additive free Watts bath; Bright film; Nickel electroplating; Supercritical carbon dioxide emulsion

Indexed keywords

BRIGHT FILM; CONVENTIONAL METHODS; GRAIN SIZE; HYDROGEN SOLUBILITY; NICKEL ELECTROPLATING; NICKEL FILM; SUPERCRITICAL CARBON DIOXIDES; WATTS BATHS;

CARBON DIOXIDE; ELECTROLESS PLATING; ELECTROPLATING; EMULSIFICATION; METALLIC FILMS; NICKEL; NICKEL COATINGS; SCANDIUM; SURFACE ROUGHNESS;

SUPERCRITICAL FLUID EXTRACTION;

EID: 77955711268     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.06.037     Document Type: Article

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