Pulse electrodeposition of nanocrystalline nickel using ultra narrow pulse width and high peak current density

Surface and Coatings Technology

Volumn 168, Issue 2-3, 2003, Pages 123-128

  Qu, N S ^a   Zhu, D ^a   Chan, K C ^b   Lei, W N ^a  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

Hardness; Nanocrystalline materials; Nickel electrodeposition; Pulse plating

Indexed keywords

ADDITIVES; CURRENT DENSITY; ELECTRODEPOSITION; GRAIN SIZE AND SHAPE; HARDNESS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NUCLEATION; SYNTHESIS (CHEMICAL); TEXTURES;

PULSE ELECTRODEPOSITION;

NICKEL PLATING;

COATING; ELECTRODEPOSITION; ELECTROPLATING; HARDNESS; NICKEL; PULSED FLOW;

EID: 0037461449     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00014-8     Document Type: Article

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