The effect of current density on the grain size of electrodeposited nanocrystalline nickel coatings

Surface and Coatings Technology

Volumn 202, Issue 16, 2008, Pages 3772-3776

  Rashidi, A M ^a,b   Amadeh, A ^a  

^a UNIVERSITY OF TEHRAN   (Iran)

^b RAZI UNIVERSITY   (Iran)

Author keywords

Current density; Grain size; Nanocrystalline; Nickel coating; Theoretical model

Indexed keywords

COATINGS; CURRENT DENSITY; ELECTRODEPOSITION; ELECTROPLATING; GRAIN SIZE AND SHAPE; MATHEMATICAL MODELS; NANOCRYSTALLINE MATERIALS; X RAY DIFFRACTION ANALYSIS;

ELECTROCRYSTALLIZATION; ELECTRODEPOSITED NANOCRYSTALLINE NICKEL COATINGS;

NICKEL;

COATINGS; CURRENT DENSITY; ELECTRODEPOSITION; ELECTROPLATING; GRAIN SIZE AND SHAPE; MATHEMATICAL MODELS; NANOCRYSTALLINE MATERIALS; NICKEL; X RAY DIFFRACTION ANALYSIS;

EID: 41849144448     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.01.018     Document Type: Article

References (63)

1. Wang L., Gao Y., Xu T., and Xue Q. Mater. Chem. Phys. 99 (2006) 96
2. Tjong S.C., and Chen H. Mater. Sci. Eng. R 45 (2004) 1
3. Suryanarayana C., and Koch C.C. Hyperfine Interactions 130 (2000) 5
4. Erb U. Canadian Metall. Quar. 34 (1995) 272
5. El-Sherik A.M., and Erb U. J. Mater. Sci. 30 (1995) 5743
6. Winand R. Hydrometallurgy 29 (1992) 567
7. Winand R. Electrochim. Acta 39 (1994) 1091
8. Winand R. J. Appl. Electrochem. 21 (1991) 377
9. Dini J.W. Electrodeposition: The Material Science of Coatings and Substrates (1993), Noyes Publications
10. Dini J.W. Plat. Surf. Finish. 75 (1988) 11
11. Bakony I., Tóth-Kádár E., pogány L., Cziráki Á., Gero{double acute}cs I., Varga-Josepovits K., Arnold B., and Wetig K. Surf. Coat. Tech. 78 (1996) 124
12. El-Sherik A.M., Erb U., Palumbo G., and Aust K.T. Scr. Metall. Mater. 27 (1992) 1185
13. Schuh C.A., Nieh T.G., and Yamasaki T. Scr. Mater. 46 (2002) 735
14. Konstantinidis D.A., and Aifantis E.C. Nanostr. Mater. 10 (1998) 1111
15. Takeuchi S. Scr. Mater. 44 (2001) 1483
16. Schmickler W. Interfacial Electrochemistry (1996), OUP, Oxford
17. Winand R. Electrochim. Acta, 43 (1998) 2925
18. Ebrahimi F., and Ahmed Z. J. Appl. Electrochem. 33 (2003) 733
19. Qu N.S., Zhu D., Chan K.C., and Lei W.N. Surf. Coat. Tech. 168 (2003) 123
20. El-Sherik A.M., Erb U., and Page J. Surf. Coat. Tech. 88 (1996) 70
21. Pin-Qiang D., Hui Y., and Qiang L. Trans. Mater. Heat Treatment 25 (2004) 1283
22. Choo R.T.C., Togri J.M., El-Sherik A.M., and Erb U. J. Appl. Electrochem. 25 (1995) 384
23. Tóth-Kádár E., Bakonyi I., Sólyom A., Hering J., Konczos G., and Pavlyák F. Surf. Coat. Tech. 31 (1987) 31
24. Ungár T., Gubicza J., Ribárik G., and Borbély A. J. Appl. Crys. 34 (2001) 298
25. Scardi P., Leoni M., and Delhez R. J. Appl. Crys. 37 (2004) 381
26. Ungár T., Dragomir I., Révész Á., and Borbély A. J. Appl. Crys. 32 (1999) 992
27. Peng X., Zhang Y., Zhao J., and Wang F. Electrochim. Acta 51 (2006) 4922
28. Gu C., Lian J., He J., Jiang Z., and Jiang Q. Surf. Coat. Tech. 200 (2006) 5413
29. D.J. Guidry, M.Sc. Thesis, Louisiana State University, May 2002.
30. Kumar K.S., Suresh S., Chisholm M.F., Horton J.A., and Wang P. Acta Mater. 51 (2003) 387
31. Mishra R., Basu B., and Balasubramaniam R. Mater. Sci. Eng. A 373 (2004) 370
32. Morgan K.L., Ahmed Z., and Ebrahimi F. Mat. Res. Soc. Symp. 634 (2001) Materials Research Society
33. Rasmussen A.A., Møller P., and Somers M.A.J. Surf. Coat. Tech. 200 (2006) 6037
34. Cziráki Á., Fogarassy B., Gero{double acute}cs I., Tóth-Kádár E., and Bakony I. J. Mater. Sci. 29 (1994) 4771
35. Bakony I., Tóth-Kádár E., Tarnóczi T., Varga L.K., Cziráki Á., Gero{double acute}cs I., and Fogarassy B. Nonstr. Mater. 3 (1993) 155
36. Milchev A. Electrocrystallization, Fundamentals of Nucleation and Growth (2002), Kluwer Academic Publishers
37. Milchev A. J. Electroanal. Chem. 612 (2008) 42
38. Saraby-Reintjes A., and Fleischmann M. Electrochim. Acta 29 (1984) 557
39. Scharifker B., and Hills G. Electrochim. Acta 28 (1983) 879
40. Abyaneh M.Y., and Fleischmann M. J. Electroanal. Chem. 119 (1981) 187
41. M. Paunovic, M. Schlesinger, Fundamentals of Electrochemical Deposition, Wiley Interscience Publication, John Wiley & Sons, Inc., 1998.
42. Butler J.A.V. Trans. Farad. Soc. 19 (1924) 734
43. Butler J.A.V. Trans. Farad. Soc. 28 (1932) 379
44. Erdey-Gruz T., and Volmer M. Z. Phys. Chem. A 150 (1930) 203
45. Erdey-Gruz T., and Volmer M. Z. Phys. Chem. A 157 (1931) 165
46. Budevski E., Staikovb G., and Lorenz W.J. Electrochim. Acta 45 (2000) 2559
47. Mostany J., Mozota J., and Scharifker B.R. J. Electroanal. Chem. 177 (1984) 25
48. Serruya A., Mostany J., and Scharifker B.R. J. Electroanal. Chem. 464 (1999) 39
49. Fleischmann M., and Thirsk H.R. Trans. Faraday Sot. 51 (1955) 71
50. Staikov G., and Milchev A. Electrocrystallization in Nanotechnology (2007), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
51. Milchev A., and Heerman L. Electrochim. Acta 48 (2003) 2903
52. Milchev A., Stoyanov S., and Kaischew R. Thin Solid Films 22 (1974) 255
53. Milchev A., Stoyanov S., and Kaischew R. Thin Solid Films 22 (1974) 267
54. Milchev A. Contemp. Phys. 32 (1991) 321
55. Munoz A.G., Salinas D.R., and Bessone J.B. Thin Solid Films. 429 (2003) 119
56. Abyaneh M.Y., and Fleischmann M. J. Electroanal. Chem. 530 (2002) 89
57. Correia A.N., Machado S.A.S., and Avaca L.A. J. Electroanal. Chem. 488 (2000) 110
58. Petrovića Ž., Metikoš-Huković M., Grubač Z., and Omanović S. Thin Solid Films 513 (2006) 193
59. Aaboubi O., Amblard J., Chopart J.P., and Olivier A. J. Phys. Chem. B, 105 (2001) 7205
60. Mohanty U.S., Tripathy B.C., Singh P., and Das S.C. Miner. Eng. 15 (2002) 531
61. Ibrahim M.A.M. J. Appl. Electrochem. 36 (2006) 295
62. Brande P.V., Dumont A., and Winand R. J. Appl. Electrochem. 24 (1994) 201
63. Epelboin I., and Wiart R. J. Electrochem. Soc. 118 (1971) 1578