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Volumn 54, Issue 11, 2010, Pages 1485-1487

Mechanical bending effect on the photo leakage currents characteristic of amorphous silicon thin film transistors

Author keywords

A Si:H TFTs; Mechanical strain; Photo leakage current

Indexed keywords

A-SI:H; ACTIVITY ENERGY; AMORPHOUS SILICON THIN FILM TRANSISTORS; BENDING STRAIN; DENSITY OF STATE; MECHANICAL BENDING; MECHANICAL STRAIN; PHOTO-LEAKAGE CURRENT; RECOMBINATION CENTERS;

EID: 77955662418     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2010.04.006     Document Type: Article
Times cited : (2)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.