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Volumn 54, Issue 11, 2010, Pages 1485-1487
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Mechanical bending effect on the photo leakage currents characteristic of amorphous silicon thin film transistors
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Author keywords
A Si:H TFTs; Mechanical strain; Photo leakage current
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Indexed keywords
A-SI:H;
ACTIVITY ENERGY;
AMORPHOUS SILICON THIN FILM TRANSISTORS;
BENDING STRAIN;
DENSITY OF STATE;
MECHANICAL BENDING;
MECHANICAL STRAIN;
PHOTO-LEAKAGE CURRENT;
RECOMBINATION CENTERS;
AMORPHOUS FILMS;
EXTRACTION;
LEAKAGE CURRENTS;
SEMICONDUCTING SILICON COMPOUNDS;
STRAIN;
THIN FILM TRANSISTORS;
AMORPHOUS SILICON;
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EID: 77955662418
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/j.sse.2010.04.006 Document Type: Article |
Times cited : (2)
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References (13)
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