Electrophotographically patterned thin-film silicon transistors

IEEE Electron Device Letters

Volumn 17, Issue 6, 1996, Pages 264-266

  Gleskova, H ^a,b   Konenkamp R ^a,c   Wagner, S ^a   Shen, D S ^d  

^a Princeton University   (United States)

^b Comenius University ^*  (Slovakia)

^c HAHN MEITNER INSTITUT   (Germany)

^d UNIVERSITY OF ALABAMA IN HUNTSVILLE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ELECTRIC CONTACTS; ELECTROCHEMICAL ELECTRODES; EVAPORATION; MASKS; NITRIDES; PHOTORESISTS; PRINTING; SEMICONDUCTING GLASS; SEMICONDUCTOR DEVICE MANUFACTURE; SPUTTER DEPOSITION;

CONTACT HOLE OPENING; ELECTROPHOTOGRAPHIC PRINTING; GLASS FOIL; LASER PRINTED PATTERNS; THIN FILM SILICON TRANSISTORS; TONER MASK;

THIN FILM TRANSISTORS;

EID: 0030170499     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.496452     Document Type: Article

References (2)

1. H. Gleskova, S. Wagner, and D. S. Shen, "Electrophotographic Patterning of Thin-Film Silicon on Glass Foil," Electron Device Lett., vol. 16, pp. 418-420, 1995.
2. _, "Electrophotographic Patterning of α-Si:H," in Mater. Res. Soc. Symp. Proc., vol. 377, 1995, pp. 719-724.