Epitaxial growth of ZnO thin films on AlN substrates deposited at low temperature by magnetron sputtering

Physica Status Solidi (A) Applications and Materials Science

Volumn 207, Issue 7, 2010, Pages 1604-1608

  Rahmane, S ^a   Abdallah, B ^a,b   Soussou, A ^a   Gautron, E ^a   Jouan, P Y ^a   Le Brizoual, L ^a   Barreau, N ^a   Soltani, A ^c   Djouadi, M A ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b DEPARTMENT OF MOLECULAR BIOLOGY AND BIOTECHNOLOGY   (Syrian Arab Republic)

^c INSTITUT D ELECTRONIQUE   (France)

Author keywords

Growth; Magnetron sputtering; Structure; ZnO

Indexed keywords

ALN; ALN FILMS; ALN SUBSTRATES; ALUMINIUM NITRIDE; AMORPHOUS ZONES; CRYSTALLINE PHASE; CRYSTALLINE QUALITY; GROWTH; HRTEM IMAGES; LOW TEMPERATURES; NANOCRYSTALLINE LAYERS; RF REACTIVE MAGNETRON SPUTTERING; ROOM TEMPERATURE; SELECTED AREA ELECTRON DIFFRACTION PATTERN; STRUCTURE; ZNO; ZNO BUFFER LAYER; ZNO FILMS; ZNO SUBSTRATE; ZNO THIN FILM;

ALUMINUM COMPOUNDS; AMORPHOUS FILMS; CRYSTALLINE MATERIALS; DC POWER TRANSMISSION; DIFFRACTION; EPITAXIAL FILMS; EPITAXIAL GROWTH; FILM GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HOLOGRAPHIC INTERFEROMETRY; MAGNETRON SPUTTERING; METALLIC FILMS; NITRIDES; OXIDE FILMS; OXYGEN; PHASE INTERFACES; RESISTORS; ZINC; ZINC OXIDE;

SUBSTRATES;

EID: 77955646159     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200983776     Document Type: Article

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