Nanostructured optical waveguide films of TiO2 and WO 3-x for photonic gas sensors

Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4597-4602

  Stankova, N E ^a   Dimitrov, I G ^a   Atanasov, P A ^a   Sakano, T ^b   Yata, Y ^b   Obara, M ^b  

^a INSTITUTE OF ELECTRONICS   (Bulgaria)

^b KEIO UNIVERSITY   (Japan)

Author keywords

Nanostructured films; Photonic gas sensors; TiO2; WO3 x

Indexed keywords

CHEMICAL COMPOSITIONS; GAS EXPOSURE; GAS SENSING APPLICATIONS; GAS SENSITIVITY; GAS SENSORS; HIGH QUALITY; LINE SHIFTS; M-LINE SPECTROSCOPY; NANO-STRUCTURED; NANOSTRUCTURED FILMS; OPTICAL RESPONSE; OPTICAL WAVEGUIDE FILMS; PULSED-LASER DEPOSITION TECHNIQUE; ROOM TEMPERATURE; SCANNING ELECTRONS; SMOOTH SURFACE; TIO; UV-VIS-NIR; WO3-X;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; GAS DETECTORS; GASES; NANOSTRUCTURED MATERIALS; OPTICAL RECORDING; OPTICAL WAVEGUIDES; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SENSITIVITY ANALYSIS; SENSORS; WAVEGUIDES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL FILMS;

EID: 77955595607     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.040     Document Type: Conference Paper

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