Thin (0 0 1) tungsten trioxide films grown by laser deposition

Applied Surface Science

Volumn 247, Issue 1-4, 2005, Pages 401-405

  Stankova, N E ^a   Atanasov, P A ^a   Stanimirova, T J ^a   Dikovska, A Og ^a   Eason, R W ^b  

^a INSTITUTE OF ELECTRONICS   (Bulgaria)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Crystal structure; Optical properties; Pulsed laser deposition; WO 3 thin films

Indexed keywords

CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; ELECTRIC PROPERTIES; EXCIMER LASERS; FILM GROWTH; LASER ABLATION; LIGHT TRANSMISSION; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; TEXTURES; TUNGSTEN;

GAS-CHROMATIC PROPERTIES; POLYCRYSTALLINE FILMS; THERMAL EVAPORATION; WO3 THIN FILMS;

THIN FILMS;

EID: 19744370055     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.057     Document Type: Article

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