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Volumn 4, Issue 2, 2000, Pages 311-318
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New approach in layer-by-layer growth of oxide materials by pulsed laser deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
EPITAXIAL GROWTH;
ETCHING;
EXCIMER LASERS;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
RELAXATION PROCESSES;
SINGLE CRYSTALS;
STRONTIUM COMPOUNDS;
THIN FILMS;
INTERVAL DEPOSITION;
LAYER BY LAYER GROWTH;
PULSED LASER DEPOSITION;
STRONTIUM TITANATE;
OXIDE SUPERCONDUCTORS;
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EID: 0034205157
PISSN: 13853449
EISSN: None
Source Type: Journal
DOI: 10.1023/a:1009954307715 Document Type: Article |
Times cited : (15)
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References (10)
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