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Volumn 615 617, Issue , 2009, Pages 37-40

High temperature solution growth on free-standing (001) 3C-SiC epilayers

Author keywords

3C SiC; Dipping method; Solution growth; Stacking faults

Indexed keywords

EPILAYERS; STACKING FAULTS; SUBSTRATES;

EID: 77955449080     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.615-617.37     Document Type: Conference Paper
Times cited : (1)

References (13)
  • 7
    • 0036531088 scopus 로고    scopus 로고
    • 3C-SiC hetero-epitaxial growth on undulant Si(0 0 1) substrate
    • DOI 10.1016/S0022-0248(01)02233-3, PII S0022024801022333
    • H. Nagasawa, K. Yagi and T. Kawahara: J. Crystal Growth Vol. 237 (2002), p. 1244 doi:10.1016/S0022-0248(01)02233-3. (Pubitemid 34550261)
    • (2002) Journal of Crystal Growth , vol.237-239 , Issue.1-4 II , pp. 1244-1249
    • Nagasawa, H.1    Yagi, K.2    Kawahara, T.3
  • 9
    • 30344458195 scopus 로고    scopus 로고
    • Hetero- and homo-epitaxial growth of 3C-SiC for MOS-FETs
    • DOI 10.1016/j.mee.2005.10.046, PII S0167931705005137
    • H. Nagasawa, K. Yagi, T. Kawahara, N. Hatta: Microelectron. Eng. Vol. 83 (2006), p. 185 doi:10.1016/j.mee.2005.10.046. (Pubitemid 43065208)
    • (2006) Microelectronic Engineering , vol.83 , Issue.1 SPEC. ISSUE , pp. 185-188
    • Nagasawa, H.1    Yagi, K.2    Kawahara, T.3    Hatta, N.4    Abe, M.5
  • 12


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.