The applicability of ultra thin silicon films as interlayers for CVD diamond deposition on steels

Physica Status Solidi (A) Applied Research

Volumn 195, Issue 2, 2003, Pages 383-395

  Buijnsters, J G ^a   Shankar, P ^a,b   Van Enckevort, W J P ^a   Schermer, J J ^a   Ter Meulen, J J ^a  

^a RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDES; CHEMICAL VAPOR DEPOSITION; DENSITY (SPECIFIC GRAVITY); DIAMOND FILMS; DIFFUSION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SOOT; STAINLESS STEEL; SURFACES; THERMAL EFFECTS; ULTRATHIN FILMS;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION; INTERLAYERS; ULTRA THIN SILICON FILMS;

SILICON;

EID: 0037281422     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200305947     Document Type: Article

References (27)

1. S. J. Bull and P. R. Chalker, JOM-J. Min. Met. Mat. S. 47, 16 (1995).
2. J. J. Cuomo, J. P. Doyle, J. Bruley, and J. C. Liu, J. Vac. Sci. Technol. A 9, 2210 (1991).
3. F. Akatsuka, Y. Hirose, and K. Komaki, Jpn. J. Appl. Phys. 27, L1600 (1988).
4. C. B. Collins, Appl. Phys. Lett. 54, 216 (1989).
5. U. Müller and R. Hauert, Mat. Res. Soc. Symp. Proc. 436, 299 (1997).
6. C. Dumkum, D. M. Grant, and I. R. McColl, Diam. Relat. Mater. 6, 802 (1997).
7. R. A. Erck, F. A. Nichols, and J. F. Dierks, J. Vac. Sci. Technol. A 12(4), 1583 (1994).
8. A. Erdemir, M. Switala, R. Wei, and P. Wilbur, Surf. Coat. Technol. 50, 17 (1991).
9. S. X. Wang, Rare Met. Mater. Eng. 30, 440 (2001).
10. S. Kono, T. Goto, T. Abukawa, C. Wild, P. Koidl, and H. Kawarada, Jpn. J. Appl. Phys. 39, 4372 (2000).
11. T. P. Ong and R. P. H. Chang, Appl. Phys. Lett. 58, 358 (1991).
12. J. G. Buijnsters, P. Shankar, W. Fleischer, W. J. P. van Enckevort, J. J. Schermer, and J. J. ter Meulen, Diam. Relat. Mater. 11, 536 (2002).
13. H. C. Shih, C. P. Sung, W. L. Fan, and C. L. Lee, Surf. Coat. Technol. 57, 197 (1993).
14. O. Glozman, A. Berner, D. Shechtman, and A. Hoffman, Diam. Relat. Mater. 7, 597 (1998).
15. L. Schäfer, M. Fryda, T. Stolley, L. Xiang, and C.-P. Klages, Surf. Coat. Technol. 116-119, 447 (1999).
16. C. F. M. Borges, E. Pfender, and J. Heberlein, Diam. Relat. Mater. 10, 1983 (2001).
17. V. Baranauskas, A. C. Peterlevitz, H. J. Ceragioli, A. L. S. Souto, and S. F. Durrant, Thin Solid Films 398, 255 (2001).
18. W. J. P. van Enckevort, G. Janssen, and L. J. Giling, J. Cryst. Growth 113, 295 (1991).
19. J. G. Buijnsters, R. V. Subba Rao, P. Shankar, W. J. P. van Enckevort, J. J. Schermer, A. Gebert, and J. J.ter Meulen, to be submitted.
20. P. S. Weiser and S. Prawer, Diam. Relat. Mater. 4, 710 (1995).
21. J. Ahn, F. H. Tan, and H. S. Tan, Diam. Relat. Mater. 2, 353 (1992).
22. M. Frenklach and H. Wang, Phys. Rev. B 43, 1520 (1991).
23. H. Mehrer, M. Eggersmann, A. Gude, M. Salamon, and B. Sepiol, Mater. Sci. Eng. A 239-240, 889 (1997).
24. J. G. Buijnster, P. Shankar, W. J. P. van Enckevort, J. J. Schermer, and J. J. ter Meulen, work will be presented at 8th International Conference New Diamond Science and Technology, Melbourne, Australia, 21-26 July 2002.
25. S. Bühlmann, E. Blank, R. Haubner, and B. Lux, Diamond Relat. Mater. 8, 194 (1999).
26. M. Joksch, P. Wurzinger, P. Pongratz, R. Haubner, and B. Lux, Diam. Relat. Mater. 3, 681 (1994).
27. B. Lux, R. Haubner, H. Holzer, and R. C. DeVries, Int. J. Refract. Met. Hard Mater. 15, 263 (1997).