Diamond deposition on steel substrates with an Al interlayer

International Journal of Refractory Metals and Hard Materials

Volumn 27, Issue 2, 2009, Pages 417-420

  Li, Y S ^a   Tang, Y ^a   Yang, Q ^a   Xiao, C ^a   Hirose, A ^a  

^a UNIVERSITY OF SASKATCHEWAN   (Canada)

Author keywords

Adhesion; Aluminum interlayer; Diamond thin film; Plasma CVD; Steel

Indexed keywords

ADHESION; ALUMINA; ALUMINUM; COMPOSITE FILMS; DIAMOND CUTTING TOOLS; DIAMOND DEPOSITS; DIAMOND FILMS; DIAMONDS; FILM GROWTH; GRAPHITE; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; STEEL; STEEL METALLURGY; SUBSTRATES; THIN FILM DEVICES; THIN FILMS; VACUUM DEPOSITION;

AL FILMS; ALUMINUM INTERLAYER; ANNEALING PROCESS; BARE STEELS; COATED STEELS; CVD REACTORS; DIAMOND DEPOSITIONS; DIAMOND SUSPENSIONS; DIAMOND THIN FILM; GRAPHITE PHASE; HIGH-QUALITY DIAMONDS; INTER DIFFUSIONS; MICROWAVE PLASMAS; PHASE PURITIES; PLASMA CVD; PRE TREATMENTS; STAINLESS STEEL SUBSTRATES; STEEL SUBSTRATES; SURFACE FILMS;

STAINLESS STEEL;

EID: 59649118359     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijrmhm.2008.09.015     Document Type: Article

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