Effect of post annealing of ZnO buffer layer on the properties of hydrothermally grown ZnO nanorods

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Kim, Ah Ra ^a   Lee, Ju Young ^a   Jang, Bo Ra ^a   Kim, Hong Seung ^a   Park, Hyun Kook ^a   Cho, Young Ji ^a   Jang, Nak Won ^a  

^a Korea Maritime University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION INTENSITY; GROWTH TIME; HYDROTHERMAL PROCESS; HYDROTHERMALLY; LOW TEMPERATURES; P-TYPE SI; PEAK INTENSITY; POST ANNEALING; RADIO-FREQUENCY SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES; ULTRA-VIOLET; ZNO BUFFER LAYER; ZNO NANOROD;

ANNEALING; BUFFER LAYERS; EPITAXIAL LAYERS; NANORODS; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; TEXTURING; X RAY DIFFRACTION;

ZINC OXIDE;

EID: 77955313149     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GH10     Document Type: Article

References (19)

1. Y. Xia, P. Yang, Y. Sun, Y. Wu, B. Mayers, B. Gates, Y. Yin, F. Kim, and H. Yan: Adv. Mater. 15 (2003) 353.
2. K. Keis, L. Vayssieres, H. Rensmo, S.-E. Lindquist, and A. Hagfeldt: J. Electrochem. Soc. 148 (2001) A149.
3. Y. Xia, P. Yang, Y. Sun, Y. Wu, B. Mayers, B. Gates, Y. Yin, F. Kim, and H. Yan: Adv. Mater. 15 (2003) 353.
4. J. Y. Lee, Y. S. Choi, J. H. Kim, M. O. Park, and S. Im: Thin Solid Films 403-404 (2002) 553.
5. C. Liu, J. A. Zapien, Y. Yao, X. Meng, C. S. Lee, S. Fan, Y. Lifshitz, and S. T. Lee: Adv. Mater. 15 (2003) 838.
6. Z. L. Wang, X. Y. Kong, Y. Ding, P. Gao, W. L. Hughes, R. Yang, and Y. Zhang: Adv. Funct. Mater. 14 (2004) 943.
7. M. Rosina, P. Ferret, P.-H. Jouneau, I.-C. Robin, F. Levy, G. Feuillet, and M. Lafossas: Microelectron. J. 40 (2009) 242.
8. J. M. Lim and C. M. Lee: Thin Solid Films 515 (2007) 3335.
9. Q. Wan, K. Yu, and T. H. Wang: Appl. Phys. Lett. 83 (2003) 2253.
10. J. J. Wu, S. C. Liu, C. T. Wu, K. H. Chen, and L. C. Chen: Appl. Phys. Lett. 81 (2002) 1312.
11. S. Baruah and J. Dutta: J. Sol-Gel Sci. Technol. 50 (2009) 456.
12. D. Polsongkram, P. Chamninok, S. Pukird, and L. Chow: Physica B 403 (2008) 3713.
13. L. Vayssieres, K. Keis, S.-E. Lindquist, and A. Hagfeldt: J. Phys. Chem. B 105 (2001) 3350.
14. A. Nahhas, H. K. Kim, and J. Blachere: Appl. Phys. Lett. 78 (2001) 1511.
15. S. F. Wang, T. Y. Tseng, Y. R. Wang, C. Y. Wang, and H. C. Lu: Ceram. Int. 35 (2009) 1255.
16. L. Vayssieres, K. Keis, S.-E. Lindquist, and A. Hagfeldt: J. Phys. Chem. B 105 (2001) 3350.
17. J. Y. Lee, J. H. Lee, and H. S. Kim: J. Korean Phys. Soc. 55 (2009) 1568.
18. E. Çetinörgü, S. Goldsmith, and R. L. Boxman: Surf. Coat. Technol. 01 (2007) 7266.
19. P. Jiang, J. J. Zhou, H. F. Fang, C. Y. Wang, Z. L. Wang, and S. S. Xie: Adv. Funct. Mater. 17 (2007) 1303.