Residual stress of free-standing membranes of yttria-stabilized zirconia for micro solid oxide fuel cell applications

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 2, 2010, Pages 1327-1337

  Tarancón, Albert ^a   Sabaté, Neus ^a   Cavallaro, Andrea ^b   Gràcia, Isabel ^a   Roqueta, Jaume ^b   Garbayo, Inigo ^a   Esquivel, Juan P ^a   Garcia, Gemma ^a   Cané, Carles ^a   Santiso, José ^b  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

Author keywords

Membrane; MicroSOFC; MOCVD; PLD; SOFC; YSZ

Indexed keywords

CRYSTALLINITIES; DEPOSITED FILMS; DEPOSITION TECHNIQUE; FABRICATION PARAMETERS; FREE STANDING MEMBRANES; HIGH DENSITY; MEMBRANE AREA; METALORGANIC CHEMICAL VAPOR DEPOSITION; MICRO SOLID OXIDE FUEL CELLS; MICROFABRICATION PROCESS; MICROSOFC; MOCVD; SILICON TECHNOLOGIES; STABILIZED ZIRCONIA; SUBSTRATE DEPOSITION; SURFACE AREA; THERMOMECHANICAL STABILITY; YTTRIA-STABILIZED ZIRCONIA THIN FILMS;

DEPOSITION; MEMBRANES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDE FILMS; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; PULSED LASERS; RESIDUAL STRESSES; SEMICONDUCTING ALUMINUM COMPOUNDS; SOLID OXIDE FUEL CELLS (SOFC); SUBSTRATES; YTTRIUM ALLOYS; ZIRCONIA;

YTTRIA STABILIZED ZIRCONIA;

EID: 77954971688     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.1837     Document Type: Conference Paper

References (21)

1. J. L. Hertz, J. Lappalanien, D. Kek, T. Stefanik, and H. L. J. Tuller, Electrochem. Soc. Proc. 25, 137 (2002).
2. Z. P. Shao, S. M. Haile, J. Ahn, P. D. Ronney, Z. L. Zhan, and S. A. Barnett, Nature 435, 795 (2005).
3. D. Nikbin, The Fuel Cell Review 3, 21 (2006).
4. A. Bieberle-Hiitter, D. Beckel, A. Infortuna, U. Muecke, J. Rupp, L. Gauckler, S. Rey-Mermet, P. Muralt, N. Bieri, N. Hotz, M. Stutz, D. Poulikakos, P. Heeb, P. Miiller, A. Bernard, R. Gmiir, and T. Hocker, J. Power Sources 177, 123 (2008).
5. J. B. Goodenough, Anna. Rev. Mater. Res. 33, 91 (2003).
6. Y. Yamazaki, Electrochim. Acta 50, 663 (2004).
7. D. Beckel, A. Bieberle-Hiitter, A. Harvey, A. Infortuna, U. P. Muecke, M. Prestat, J. L. M. Rupp, and L. J. Gauckler, J. Power Sources 173, 325 (2007).
8. S. Pei-Chen, C. Chen-Chieh, S. Jonn-Hyun, F. Rainer, and P. B. Fritz, Nano Lett. 8, 2289 (2008).
9. J. Cerdà Belmonte, J. Puigcorbé, J. Arbiol, A. Vila, J. R. Morante, N. Sabaté, I. Gràcia, and C. Cané, Sens. Actuators, B 114, 826 (2006).
10. Y. Tang, K. Stanley, J. Wu, D. Gosh, and J. Zhang, J. Micromech. Microeng. 15, 185 (2005).
11. V. T. Srikar, K. T. Turner, T. Y. A. Ie, and S. M. Spearing, J. Power Sources 125, 62 (2004).
12. A. Infortuna, A. Harvey, and L. J. Gauckler, Adv. Fund. Mater. 18, 127 (2008).
13. V. Ziebart and O. Paul, J. Microeleclromech. Sys. 8, 423 (1999).
14. M. S. Kennedy, A. L. Olson, J. C. Raupp, N. R. Moody, and D. F. Bahr, Microsys. Tech. 11, 298 (2005).
15. M. Birkholz, Thin Film Analysis by X-Ray Scattering, WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim (2006).
16. M. Fujikane, D. Setoyama, S. Nagao, R. Nowak, and S. Yamanaka, J. Alloys Compd. 431, 250 (2007).
17. J. W. Beams, Structure and Properties of Thin Films, Wiley & Sons, New York (1959).
18. W. D. Nix and J. J. Vlassak, J. Mater. Res. 7, 3242 (1992).
19. D. G. Lamas and N. E. Walsoe de Reca, J. Mater. Sci. 35, 5563 (2000).
20. C. D. Baertsch, K. F. Jensen, J. L. Hertz, H. L. Tuller, S. T. Vengallatore, S. M. Spearing, and M. A. Schmidt, J. Mater. Res. 19, 2604 (2004).
21. D. J. Quinn, B. Wardle, and S. M. Spearing, J. Mater. Res. 23, 609 (2008).