Maskless photolithography via holographic optical projection

Optics Letters

Volumn 35, Issue 13, 2010, Pages 2230-2232

  Bay, Christoph ^a   Hübner, Nils ^b   Freeman, Jon ^a   Wilkinson, Tim ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b PFORZHEIM UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADAPTIVE SOFTWARE; COMPUTER GENERATED HOLOGRAMS; DIFFRACTION LIMITED; HOLOGRAPHIC PROJECTION; LIQUID CRYSTAL ON SILICON; LITHOGRAPHIC MASK; MASK LESS; OPTICAL LITHOGRAPHY; OPTICAL PROJECTIONS; PHASE-ONLY; PHOTOLITHOGRAPHIC PROCESS; SPATIAL LIGHT MODULATORS;

CONCURRENT ENGINEERING; JOB ANALYSIS; LIGHT MODULATION; LIGHT MODULATORS; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; RAPID PROTOTYPING;

COMPUTER GENERATED HOLOGRAPHY;

EID: 77954966016     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.002230     Document Type: Article

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