Nonplanar photolithography with computer-generated holograms

Optics Letters

Volumn 30, Issue 11, 2005, Pages 1300-1302

  Maiden, A ^a   McWilliam, R ^a   Purvis, A ^a   Johnson, S ^a   Williams, G L ^b   Seed, N L ^b   Ivey, P A ^c  

^a DURHAM UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF SHEFFIELD   (United Kingdom)

^c Innotec Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPUTER GENERATED HOLOGRAPHY; INTEGRAL EQUATIONS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; PHOTORESISTS; SIGNAL TO NOISE RATIO; SUBSTRATES;

COMPUTER GENERATED HOLOGRAPHIC (CGH) PATTERNS; FRESNEL INTEGRAL; NONPLANAR PHOTOLITHOGRAPHY; NONPLANAR SUBSTRATES;

PHOTOLITHOGRAPHY;

EID: 20444473058     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.30.001300     Document Type: Article

References (9)

1. A. K.-K. Wong, Resolution Enhancement Techniques in Optical Lithography (SPIE Press, Bellingham, Wash., 2001).
2. G. L. Williams, I. Wallhead, V. Sarojiniamma, P. A. Ivey, and N. L. Seed, Sens. Actuators A 112, 360 (2004).
3. F. Clube, S. Gray, D. Struchen, S. Malfoy, Y Darbellay, N. Magnon, B. Le Gratiet, and J.-C. Tisserand, Proc. SPIE 3099, 36 (1997).
4. A. Purvis, A. Maiden, R. McWilliam, G. L. Williams, N. L. Seed, and P. A. Ivey, "Holographic lithography," U.K. patent 0418815.7 (filed August 24, 2004).
5. Ch. Frere, D. Leseberg, and O. Bryngdahl, J. Opt. Soc. Am. A 3, 726 (1986).
6. R. Hauck, J. Opt. Soc. Am. A 1, 5 (1984).
7. A. Lohmann and D. Paris, Appl. Opt. 6, 1739 (1967).
8. D. Merricks, in Special Polymers for Electronics and Optoelectronics, J. A. Chilton and M. T. Goosey, eds. (Chapman & Hall, London, 1995), p. 37.
9. R. Schnupp, R. Baumgärtner, R. Kühnhold, and H. Ryssel, Sens. Actuators A 85, 310 (2000).