Plasma functionalization of silicon carbide crystalline nanoparticles in a novel low pressure powder reactor

Surface and Coatings Technology

Volumn 205, Issue 1, 2010, Pages 22-29

  Hody, Hubert ^a,b   Pireaux, Jean Jacques ^a   Choquet, Patrick ^b   Moreno Couranjou, Maryline ^b  

^a UNIVERSITY OF NAMUR   (Belgium)

^b LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

Author keywords

Carboxylic functionalities; Functionalization; Nanoparticles; Plasma enhanced chemical vapor deposition (PECVD); Silicon carbide

Indexed keywords

GRAFTING (CHEMICAL); HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INORGANIC COATINGS; NANOPARTICLES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMER BLENDS; SECONDARY ION MASS SPECTROMETRY; SILICON CARBIDE; SURFACE TREATMENT; TRANSMISSION ELECTRON MICROSCOPY;

CARBIDE NANOPARTICLES; CARBOXYLIC FUNCTIONALITIES; CRYSTALLINE NANOPARTICLES; FUNCTIONALIZATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); PLASMA FUNCTIONALIZATION; POLYMER-LIKE STRUCTURES; TIME-OF-FLIGHT SECONDARY ION MASS SPECTROSCOPY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77954955483     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.05.045     Document Type: Article

References (29)

1. Chung D.D.L. Composite Materials: Science and Applications 2003, Springer Verlag, London.
2. Janin C. Actual. Chim. 1999, 225:67.
3. Denes F.S., Manolache S. Prog. Polym. Sci. 2004, 29:815.
4. Bokobza L., Leroy E., Lalanne V. Eur. Polym. J. 2009, 45:996.
5. Motornov M., Roiter Y., Tokarev I., Minko S. Prog. Polym. Sci. 2010, 35:174.
6. Azioune A., Pireaux J.-J. Joint Symposium of SAPP XV and EUJJSPP'05. Book of Contributed Papers 2005, 75.
7. He W., Guo Z., Pu Y., Yan L., Si W. Appl. Phys. Lett. 2004, 85:896.
8. Bretagnol F., Tatoulian M., Arefi-Khonsari F., Lorang G., Amouroux J. Reac. Funct. Polym. 2004, 61:221.
9. Borer B., von Rohr R. Surf. Coat. Technol. 2005, 200:377.
10. Jung S.H., Park S.H., Lee D.H., Kim S.D. Polym. Bull. 2001, 47:199.
11. Wei F., Zhu J.X. J. Chem. Eng. 1996, 64:345.
12. Wertheimer M., Thomas H., Perri M., Klemberg-Sapieha J., Martinu L. Pure Appl. Chem. 1996, 68:1047.
13. Arpagaus C., Sonnenfeld A., von Rohr P.R. Chem. Eng. Technol. 2005, 28:87.
14. Nessim C., Boulos M., Kogelschatz U. Eur. Phys. J. Appl. Phys. 2009, 47:22819.
15. Alexander M.R., Kelly J.M., Short R.D. Polymer 2003, 44:3173.
16. Nah C., Huh M.-Y., Rhee J.M., Yoon T.-H. Polym. Int. 2002, 51:510.
17. Shi D., Wang S.X., van Ooij W.J., Wang L.M., Zhao J., Yu Z. Appl. Phys. Lett. 2001, 78:1243.
18. Azioune A., Marcozzi M., Revello V., Pireaux J.-J. Surf. Interface Anal. 2007, 39:615.
19. Beamson G., Briggs D. High Resolution XPS of Organic Polymers - The ESCA300 Database 1992, Wiley, Chichester.
20. Alexander M.R., Short R.D., Jones F.R., Michaeli W., Blomfield C.J. Appl. Surf. Sci. 1999, 137:179.
21. O'Hare L.-A., Hynes A., Alexander M.R. Surf. Interface Anal. 2007, 39:926.
22. Yasuda H. Plasma Polymerization 1985, Academic Press, Orlando.
23. Shen X.-N., Zheng Y., Zhan Y.-Y., Cai G.-H., Xiao Y.-H. Mater. Lett. 2007, 61:4766.
24. Fu Q.-G., Li H.-J., Shi X.-H., Li K.-Z., Wei J., Hu Z.-B. Mater. Chem. Phys. 2006, 100:108.
25. Kang B.-C., Lee S.-B., Boo J.-H. Thin Solid Films 2004, 464-465:215.
26. Yang L., Zhang X., Huang R., Zhang G., Xue C. Physica E 2006, 35:146.
27. Zheng H., Fu Z., Lin B., Li X. J. Alloys Compd. 2006, 426:290.
28. Shen G., Chen D., Tang K., Qian Y., Zhang S. Chem. Phys. Lett. 2003, 375:177.
29. Chung G.-S., Kim K.-S., Han K.-B. Ceram. Int. 2008, 34:841.