Deposition and characterization of hard coatings in the material system V-Al-N by reactive magnetron sputter deposition

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Kolozsvári, Szilárd ^a   Pesch, Peter ^a   Ziebert, Carlos ^b   Stueber, Michael ^b   Ulrich, Sven ^b  

^a TZO Technologiezentrum für Oberflächentechnik Rhelnbreitbach GmbH   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

A1N; Bias variation; Hard coatings; Magnetron sputtering; Pressure variation; VA1N; VN

Indexed keywords

A1N; BIAS VARIATION; CHEMICAL COMPOSITIONS; CRITICAL LOAD; ELECTRON MICROPROBE ANALYSIS; FRICTION COEFFICIENTS; MAGNETRON SPUTTER DEPOSITION; MATERIAL SYSTEMS; MICRO INDENTATION; R.F. MAGNETRON SPUTTERING; REDUCED ELASTIC MODULUS; ROTATING SUBSTRATES; SCRATCH TEST; SI(1 0 0); STEEL SUBSTRATE; SUBSTRATE BIAS; SUBSTRATE TEMPERATURE; TOTAL PRESSURE; TRIBOMETERS;

ALUMINUM; BIAS VOLTAGE; CRYSTAL STRUCTURE; ELECTRON PROBE MICROANALYSIS; FRICTION; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; SUBSTRATES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

HARD COATINGS;

EID: 77954924257     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200930409     Document Type: Conference Paper

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