Formation and stability of alkylthiol monolayers on carbon substrates

Journal of Physical Chemistry C

Volumn 114, Issue 29, 2010, Pages 12635-12641

  Lockett, Matthew R ^a   Smith, Lloyd M ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL-THIOL MONOLAYERS; AMORPHOUS CARBON THIN FILMS; CARBON SUBSTRATES; CARBON SURFACE; METHANETHIOL; MONOLAYER FORMATION; NUCLEOPHILICITIES; SUBSTITUTION MECHANISMS; SULFUR ATOMS; TEMPERATURE CONDITIONS; TRIFLUOROMETHYL; WET CHEMICAL PROCESS;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; ELECTRON ENERGY LEVELS; MONOLAYERS; SUBSTITUTION REACTIONS; SULFUR;

SURFACE REACTIONS;

EID: 77954899274     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp102821x     Document Type: Article

References (30)

1. Bent, S. F. Surf. Sci. 2002, 500, 879-903
2. Hamers, R. J. In Bioelectronics: from Theory to Application; Katz, E.; Willner, I., Eds.; Wiley-VCH: Weinheim, 2005; pp 209 - 231.
3. Yang, W. S.; Auciello, O.; Butler, J. E.; Cai, W.; Carlisle, J. A.; Gerbi, J.; Gruen, D. M.; Knickerbocker, T.; Lasseter, T. L.; Russell, J. N.; Smith, L. M.; Hamers, R. J. Nat. Mater. 2002, 1, 253-257
4. Sun, B.; Colavita, P. E.; Kim, H.; Lockett, M.; Marcus, M. S.; Smith, L. M.; Hamers, R. J. Langmuir 2006, 22, 9598-9605
5. Robertson, J. Adv. Phys. 1986, 35, 317-374
6. Lockett, M. R.; Weibel, S. C.; Phillips, M. F.; Shortreed, M. R.; Sun, B.; Corn, R. M.; Hamers, R. J.; Cerrina, F.; Smith, L. M. J. Am. Chem. Soc. 2008, 130, 8611-8613
7. Lockett, M. R.; Smith, L. M. Anal. Chem. 2009, 81, 6429-6437
8. Lockett, M. R.; Smith, L. M. Langmuir 2009, 25, 3340-3343
9. Bodlaki, D.; Yamamoto, H.; Waldeck, D. H.; Borguet, E. Surf. Sci. 2003, 543, 63-74
10. Ardalan, P.; Musgrave, C. B.; Bent, S. F. Langmuir 2009, 25, 2013-2025
11. Bansal, A.; Li, X.; Lauermann, I.; Lewis, N.; Weinber, W. J. Am. Chem. Soc. 1996, 118, 7225-7226
12. Nuzzo, R. G.; Fusco, F. A.; Allara, D. L. J. Am. Chem. Soc. 1987, 109, 2358-2368
13. Bain, C. D.; Whitesides, G. M. Science 1988, 240, 62-63
14. Frey, B. L.; Corn, R. M.; Weibel, S. C. Sampling Techniques; J. Wiley and Sons: New York, 2002; Vol. 2.
15. Lockett, M. R.; Carlisle, J. C.; Le, D. V.; Smith, L. M. Langmuir 2009, 25, 5120-5126
16. Shirley, D. A. Phys. Rev. B 1972, 5, 4709-4714
17. Moulder, J. F.; Chastian, J.; Bomben, K. D.; Stickle, W. F.; King, R. C.; Sobol, P. E. Handbook of X-Ray Photoelectron Spectroscopy; Physical Electronics: Eden Prairie, MN, 1995.
18. Powell, C. J.; Jablonski, A.; National Institute of Standard and Technology, 2001.
19. CRC Handbook of Chemistry and Physics, 89th ed.; Lide, D. R., Ed.; CRC Press: Boca Raton, FL, 2008; pp 2736.
20. To see survey and high-resolution XP spectra of a chlorinated carbon-on-metal substrate, please see ref 4.
21. Even, M. A.; Lee, S.-H.; Wang, J.; Chen, Z. J. Phys. Chem. B 2006, 110, 26089-26097
22. Papirer, E.; Lacroix, R.; Donnet, J.-B.; Nanse, G.; Fioux, P. Carbon 1994, 32, 1341-1358
23. Colavita, P. E.; Sun, B.; Wang, X. Y.; Hamers, R. J. J. Phys. Chem. B 2009, 113, 1526-1535
24. Oae, S. Organic sulfur chemistry: structure and mechanism; CRC Press: Boca Raton, FL, 1991.
25. Witt, D.; Klajn, R.; Barski, P.; Grzybowski, B. A. Curr. Org. Chem. 2004, 8, 1763-1797
26. Love, J. C.; Estroff, L. A.; Kriebel, J. K.; Nuzzo, R. G.; Whitesides, G. M. Chem. Rev. 2005, 105, 1103-1170
27. Lee, H. S.; An, K. S.; Kim, Y.; Choi, C. H. J. Phys. Chem. B 2005, 109, 10909-10914
28. Lee, S. S.; Baik, J. Y.; An, K. S.; Suh, Y. D.; Oh, J. H.; Kim, Y. J. Phys. Chem. B 2004, 108, 15128-15132
29. Mikosch, J.; Trippel, S.; Eichhorn, C.; Otto, R.; Lourderaj, U.; Xhang, J. X.; Hase, W. L.; Weidemuller, M.; Wester, R. Science 2008, 319, 183-186
30. Strother, T.; Knickerbocker, T.; Russell, J. N.; Butler, J. E.; Smith, L. M.; Hamers, R. J. Langmuir 2002, 18, 968-971