High quality diamond like carbon thin film fabricated by ECR plasma CVD

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 227-230

  Kuramoto, K ^a   Domoto, Y ^a   Hirano, H ^a   Kiyama, S ^a   Tsuda, S ^a  

^a SANYO ELECTRIC CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; ELECTRONIC EQUIPMENT; HARDNESS; IONS; LOW TEMPERATURE OPERATIONS; PLASMA APPLICATIONS; PROTECTIVE COATINGS; SUBSTRATES; WEAR OF MATERIALS;

BIAS VOLTAGE; CHEMICAL INERTNESS; DIAMOND LIKE CARBON FILMS; ION IMPINGING ENERGY;

THIN FILMS;

EID: 0031547199     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00768-4     Document Type: Article

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