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Volumn 45, Issue 7, 2010, Pages 717-724
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Schottky diode characteristics: Aluminium with 500 and 1000 Å thicknesses on p type WSe2 crystal
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Author keywords
Al pWSe2 schottky diodes; Generation recombination; Metal semiconductor interface; Thermionic emission; Tunneling
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Indexed keywords
BARRIER HEIGHTS;
CONDUCTION PROPERTIES;
DIODE PARAMETERS;
GENERATION RECOMBINATION;
IDEALITY FACTORS;
METAL SEMICONDUCTOR INTERFACE;
METAL THICKNESS;
MULTIPLE CHARGE;
P-TYPE;
RICHARDSON PLOT;
SCHOTTKY DIODES;
SEMICONDUCTING CRYSTALS;
THERMIONIC EMISSION THEORY;
TOTAL CURRENT;
VAPOUR TRANSPORT;
ALUMINUM;
CURRENT VOLTAGE CHARACTERISTICS;
SCHOTTKY BARRIER DIODES;
THERMIONIC EMISSION;
TUNNELING (EXCAVATION);
SEMICONDUCTOR DIODES;
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EID: 77954805767
PISSN: 02321300
EISSN: 15214079
Source Type: Journal
DOI: 10.1002/crat.201000172 Document Type: Article |
Times cited : (9)
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References (35)
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