A study of mask inspection method with pattern priority and printability check

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Tokita, Masakazu ^a   Tsuchiya, Hideo ^a   Inoue, Takafumi ^a   Inoue, Tadao ^b   Yamabe, Masaki ^c  

^a Mask Inspection Equipment Technology Research Laboratory   (Japan)

^b Mask Design Data Technology Research Laboratory

^c ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 69949164679     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824324     Document Type: Conference Paper

References (2)

1. Takehiko Nomura, et al, "Specification and performance of the newly developed mask inspection system (NPI-5000)", Digest of papers Photomask Japan 2007, p195(2007).
2. Hideo Tsuchiya, Masakazu Tokita, Takehiko Nomura, and Tadao Inoue "Die-to-database mask inspection with variable sensitivity", Proc. SPIE 7028, 70282I (2008).