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Chemical Vapor Deposition

Volumn 16, Issue 4-6, 2010, Pages 123-126

Fluidized-bed MOCVD of Bi2O3 thin films from bismuth triphenyl under atmospheric pressure

(3) Reuge, Nicolas a Dexpert Ghys, Jeannette a Caussat, Brigitte a

a UNIVERSITÉ DE TOULOUSE (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT TEMPERATURES; BAND GAPS; BISMUTH HALIDES; BISMUTH OXIDE THIN FILMS; CERAMIC GLASS; CRYSTALLINE PHASE; CRYSTALLINE PHASIS; CRYSTALLINE SAMPLES; DIELECTRIC PERMITTIVITIES; EXPERIMENTAL CONDITIONS; GASEOUS STATE; HIGH REFRACTIVE INDEX; MOCVD; MONOCLINIC FORMS; NEUTRAL GAS; ROOM TEMPERATURE; SENSOR TECHNOLOGIES; THERMAL STABILITY;

ATMOSPHERIC PRESSURE; BISMUTH; CRYSTALLINE MATERIALS; FLUIDIZATION; MICROELECTRONICS; OPTICAL COATINGS; ORGANIC POLYMERS; OXIDE FILMS; OXYGEN; REFRACTIVE INDEX; THIN FILMS; VAPOR DEPOSITION; WAVELET TRANSFORMS;

METASTABLE PHASES;

EID: 77954343746 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200904280 Document Type: Article

Times cited : (9)

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