Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed

Powder Technology

Volumn 190, Issue 1-2, 2009, Pages 185-191

  Cadoret, L ^a   Reuge, N ^a   Pannala, S ^b   Syamlal, M ^c   Rossignol, C ^d   Dexpert Ghys, J ^d   Coufort, C ^a   Caussat, B ^a  

^a LABORATOIRE DE GÉNIE CHIMIQUE   (France)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c NATIONAL ENERGY TECHNOLOGY LABORATORY   (United States)

^d CEMES CNRS   (France)

Author keywords

Chemical Vapor Deposition (CVD); Fluidized Bed; Process modelling; Silicon; Submicron powders

Indexed keywords

CHEMICAL VAPOR DEPOSITION (CVD); FLUIDIZED BED; PROCESS MODELLING; SILICON; SUBMICRON POWDERS;

AGGLOMERATION; FLUID DYNAMICS; FLUIDIZATION; FLUIDIZED BED PROCESS; FLUIDIZED BEDS; POWDERS; SILANES; TITANIUM; TITANIUM OXIDES; VAPORS;

CHEMICAL VAPOR DEPOSITION;

ALUMINUM OXIDE; NANOCOATING; SILANE; SILICON; TITANIUM DIOXIDE;

ARTICLE; COMPUTATIONAL FLUID DYNAMICS; FLUIDIZATION; FLUIDIZED BED; FLUIDIZED BED CHEMICAL VAPOR DEPOSITION; MATERIAL COATING; PARTICLE SIZE; POWDER; PROCESS MODEL; SIMULATION; SURFACE PROPERTY;

EID: 60349089683     PISSN: 00325910     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.powtec.2008.04.083     Document Type: Article

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