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Journal of Alloys and Compounds

Volumn 502, Issue 1, 2010, Pages 220-224

Preparation and characterization of vacuum thermal evaporated trilayer Cu/Se/Al thin films

(4) Nehra, S P a Sharma, Deepshikha b Singh, M a Vijay, Y K a

a UNIVERSITY OF RAJASTHAN (India)

b BANASTHALI UNIVERSITY (India)

Author keywords

Annealing; I V characteristics; Optical band gap; Surface topography; Trilayer thin films; XRD

Indexed keywords

IV CHARACTERISTICS; TRILAYER THIN FILMS; TRILAYERS; XRD;

ANNEALING; ENERGY GAP; FILM PREPARATION; OPTICAL BAND GAPS; OPTICAL PROPERTIES; SUBSTRATES; SURFACE TOPOGRAPHY; THERMAL EVAPORATION; THIN FILMS; THREE DIMENSIONAL; TWO DIMENSIONAL; VACUUM; VACUUM EVAPORATION; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY MICROSCOPES;

TOPOGRAPHY;

EID: 77954213427 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.04.150 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.