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Volumn 502, Issue 1, 2010, Pages 195-198

TiNx thin films for energy-saving application prepared by atmospheric pressure chemical vapor deposition

Author keywords

Atmospheric pressure chemical vapor deposition; Energy saving application; Non stoichiometric; Titanium nitride

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CRYSTALLINE PROPERTIES; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL RESISTIVITY; ENERGY SAVING; ENERGY-SAVING APPLICATION; FAR INFRARED REGIONS; GLASS SUBSTRATES; LOW EMISSION; NEAR INFRARED REGION; OVER-STOICHIOMETRIC; PEAK VALUES; PLASMA WAVELENGTH; SOLAR CONTROL; STOICHIOMETRIC FILMS; TITANIUM TETRACHLORIDES; VISIBLE REGION;

EID: 77954212498     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.04.142     Document Type: Article
Times cited : (16)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.