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Volumn 502, Issue 1, 2010, Pages 195-198
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TiNx thin films for energy-saving application prepared by atmospheric pressure chemical vapor deposition
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Author keywords
Atmospheric pressure chemical vapor deposition; Energy saving application; Non stoichiometric; Titanium nitride
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Indexed keywords
ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION;
CRYSTALLINE PROPERTIES;
ELECTRICAL AND OPTICAL PROPERTIES;
ELECTRICAL RESISTIVITY;
ENERGY SAVING;
ENERGY-SAVING APPLICATION;
FAR INFRARED REGIONS;
GLASS SUBSTRATES;
LOW EMISSION;
NEAR INFRARED REGION;
OVER-STOICHIOMETRIC;
PEAK VALUES;
PLASMA WAVELENGTH;
SOLAR CONTROL;
STOICHIOMETRIC FILMS;
TITANIUM TETRACHLORIDES;
VISIBLE REGION;
ATMOSPHERIC CHEMISTRY;
ATMOSPHERIC PRESSURE;
ATMOSPHERICS;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
ELECTRIC CONDUCTIVITY;
ELECTRIC RESISTANCE;
ENERGY CONSERVATION;
INFRARED DEVICES;
OPTICAL PROPERTIES;
REFLECTION;
SOLAR ENERGY;
SUBSTRATES;
THIN FILMS;
TITANIUM;
TITANIUM NITRIDE;
SOLAR CONTROL FILMS;
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EID: 77954212498
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2010.04.142 Document Type: Article |
Times cited : (16)
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References (20)
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