Optical characterisation of BiFeO3 epitaxial thin films grown by pulsed-laser deposition

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 7, Issue 2, 2010, Pages 296-299

  Himcinschi, Cameliu ^a   Vrejoiu, Ionela ^b   Friedrich, Marion ^a   Ding, Li ^a   Cobet, Christoph ^c   Esser, Norbert ^c   Alexe, Marin ^b   Zahn, Dietrich R T ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c ISAS INSTITUTE FOR ANALYTICAL SCIENCES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH FERRITES; ELLIPSOMETRIC SPECTRA; ENERGY RANGES; EPITAXIAL STRAIN; EPITAXIAL THIN FILMS; EXTINCTION COEFFICIENTS; IN-PLANE; NB-DOPED SRTIO; OPTICAL CHARACTERISATION; OPTICAL RESPONSE; SRTIO; VACUUM ULTRAVIOLETS; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

BISMUTH; DEPOSITION; EPITAXIAL FILMS; NANOSCIENCE; OPTICAL CONSTANTS; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; STRONTIUM ALLOYS; SUBSTRATES;

SEMICONDUCTOR LASERS;

EID: 77954207910     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982414     Document Type: Conference Paper

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