Correlation of structural properties with energy transfer of Eu-doped ZnO thin films prepared by sol-gel process and magnetron reactive sputtering

Journal of Applied Physics

Volumn 107, Issue 12, 2010, Pages

  Petersen, Julien ^a,b   Brimont, Christelle ^a,d   Gallart, Mathieu ^a   Schmerber, Guy ^a   Gilliot, Pierre ^a   Ulhaq Bouillet, Corinne ^a   Rehspringer, Jean Luc ^a   Colis, Silviu ^a   Becker, Claude ^b   Slaoui, Abdelillah ^c   Dinia, Aziz ^a  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

^b LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^c Faculté de Médecine   (France)

^d UNIVERSITÉ MONTPELLIER 2   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DOPED ZNO; EFFICIENT ENERGY TRANSFER; MAGNETRON REACTIVE SPUTTERING; PHOTOLUMINESCENCE BANDS; POLYCRYSTALLINE; SI (100) SUBSTRATE; SOL-GEL TECHNIQUE; SPUTTERED FILMS; STRUCTURAL AND OPTICAL PROPERTIES; STRUCTURAL QUALITIES; TEXTURED GROWTH; TRANSMISSION ELECTRON; TRIVALENT STATE; X RAY PHOTOEMISSION SPECTROSCOPY; ZNO MATRIX; ZNO PARTICLES;

EMISSION SPECTROSCOPY; ENERGY TRANSFER; EUROPIUM; GELS; HOLOGRAPHIC INTERFEROMETRY; MAGNETRONS; METALLIC FILMS; NANOSTRUCTURED MATERIALS; OPTICAL FILMS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SOL-GELS; SOLS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

SOL-GEL PROCESS;

EID: 77954179676     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3436628     Document Type: Article

References (43)

1. T. Trupke, M. A. Green, and P. Würfel, J. Appl. Phys. JAPIAU 0021-8979 92, 1668 (2002). 10.1063/1.1492021 (Pubitemid 34924407)
2. C. W. Jia, E. Q. Xie, J. G. Zhao, Z. W. Sun, and A. H. Peng, J. Appl. Phys. JAPIAU 0021-8979 100, 023529 (2006). 10.1063/1.2221095 (Pubitemid 44183354)
3. S. Komuro, T. Katsumata, H. Kokai, T. Morikawa, and X. Zhao, Appl. Phys. Lett. APPLAB 0003-6951 81, 4733 (2002). 10.1063/1.1530733
4. J. Heikenfeld, M. Garter, D. S. Lee, R. Birkhahn, and A. J. Steckl, Appl. Phys. Lett. APPLAB 0003-6951 75, 1189 (1999). 10.1063/1.124686
5. Q. L. Liu, Y. Bando, F. F. Xu, and C. C. Tang, Appl. Phys. Lett. APPLAB 0003-6951 85, 4890 (2004). 10.1063/1.1825619 (Pubitemid 40715159)
6. A. J. Steckl and R. Birkhahn, Appl. Phys. Lett. APPLAB 0003-6951 73, 1700 (1998). 10.1063/1.122250 (Pubitemid 128671957)
7. R. Bazzi, M. A. Flores, C. Louis, K. Lebbou, W. Zhang, C. Dujardin, S. Roux, B. Mercier, G. Ledoux, E. Bernstein, P. Perriat, and O. Tillement, J. Colloid Interface Sci. JCISA5 0021-9797 273, 191 (2004). 10.1016/j.jcis.2003.10. 031 (Pubitemid 38407386)
8. A. K. Pradhan, L. Douglas, H. Mustafa, R. Mundle, D. Hunter, and C. E. Bonner, Appl. Phys. Lett. APPLAB 0003-6951 90, 072108 (2007). 10.1063/1.2560764 (Pubitemid 46280694)
9. A. Ishizumi and Y. Kanemitsu, Appl. Phys. Lett. APPLAB 0003-6951 86, 253106 (2005). 10.1063/1.1952576 (Pubitemid 41244092)
10. D. G. Thomas, J. Phys. Chem. Solids JPCSAW 0022-3697 15, 86 (1960). 10.1016/0022-3697(60)90104-9
11. E. Mollwo, Z. Phys. Chem. ZPCFAX 0942-9352 198, 257 (1951)
12. H. Weiss, Z. Phys. ZEPYAA 0044-3328 132, 335 (1952) 10.1007/BF01331485
13. G. Heiland, J. Phys. Chem. Solids JPCSAW 0022-3697 6, 155 (1958) 10.1016/0022-3697(58)90089-1
14. P. Sharma, A. Mansingh, and K. Sreenivas, Appl. Phys. Lett. APPLAB 0003-6951 80, 553 (2002) 10.1063/1.1445480 (Pubitemid 34148229)
15. Y. R. Ryu, T. S. Lee, J. A. Lubguban, H. W. White, Y. S. Park, and C. J. Youn, Appl. Phys. Lett. APPLAB 0003-6951 87, 153504 (2005). 10.1063/1.2089176 (Pubitemid 41717174)
16. C. Agashe, O. Kluth, G. Schope, H. Siekmann, J. Hupkes, and B. Rech, Thin Solid Films THSFAP 0040-6090 442, 167 (2003). 10.1016/S0040-6090(03)00966-0
17. T. Dietl, H. Ohno, F. Matsukura, J. Cibert, and D. Ferrand, Science SCIEAS 0036-8075 287, 1019 (2000). 10.1126/science.287.5455.1019 (Pubitemid 30094353)
18. M. Bouloudenine, N. Viart, S. Colis, J. Kortus, and A. Dinia, Appl. Phys. Lett. APPLAB 0003-6951 87, 052501 (2005) 10.1063/1.2001739
19. J. Alaria, M. Bouloudenine, G. Schmerber, S. Colis, A. Dinia, P. Turek, and M. Bernard, J. Appl. Phys. JAPIAU 0021-8979 99, 08M118 (2006). 10.1063/1.2172887
20. Z. L. Wang, Adv. Mater. ADVMEW 0935-9648 19, 889 (2007). 10.1002/adma.200602918 (Pubitemid 46932825)
21. P. Verardi and M. Dinescu, IEEE Ultrasonics Symposium Proceedings PIEUEZ 1051-0117 2, 1015 (1995).
22. A. Teke, Ü. Özgür, S. Doǧan, X. Gu, H. Morko̧, B. Nemeth, J. Nause, and H. O. Everitt, Phys. Rev. B PRBMDO 0163-1829 70, 195207 (2004). 10.1103/PhysRevB.70.195207 (Pubitemid 40142683)
23. Y. -K. Park, J. -I. Han, M. -G. Kwak, H. Yang, S. -H. Ju, and W. -S. Cho, Appl. Phys. Lett. APPLAB 0003-6951 72, 668 (1998). 10.1063/1.120833 (Pubitemid 128672375)
24. M. Abdullah, T. Morimoto, and K. Okuyama, Adv. Funct. Mater. AFMDC6 1616-301X 13, 800 (2003). 10.1002/adfm.200304330
25. Y. -P. Du, Y. -W. Zhang, L. -D. Sun, and C. -H. Yan, J. Phys. Chem. C JPCCCK 1932-7447 112, 12234 (2008). 10.1021/jp802958x
26. S. Komuro, T. Katsumata, T. Morikawa, X. Zhao, H. Isshiki, and Y. Aoyagi, Appl. Phys. Lett. APPLAB 0003-6951 76, 3935 (2000). 10.1063/1.126826
27. M. Zhong, G. Shan, Y. Li, G. Wang, and Y. Liu, Mater. Chem. Phys. MCHPDR 0254-0584 106, 305 (2007). 10.1016/j.matchemphys.2007.06.007 (Pubitemid 47599738)
28. A. Ishizumi, Y. Taguchi, A. Yamamoto, and Y. Kanemitsu, Thin Solid Films THSFAP 0040-6090 486, 50 (2005). 10.1016/j.tsf.2004.11.229 (Pubitemid 40952539)
29. S. Fujihara, A. Suzuki, and T. Kimura, J. Appl. Phys. JAPIAU 0021-8979 94, 2411 (2003). 10.1063/1.1594817
30. S. A. M. Lima, F. A. Sigoli, and M. R. Davolos, J. Solid State Chem. JSSCBI 0022-4596 171, 287 (2003). 10.1016/S0022-4596(02)00178-0
31. C. Panatarani, I. W. Lenggoro, and K. Okuyama, J. Phys. Chem. Solids JPCSAW 0022-3697 65, 1843 (2004). 10.1016/j.jpcs.2004.06.008
32. G. -R. Li, C. -R. Dawa, X. -H. Lu, X. -L. Yu, and Y. -X. Tong, Langmuir LANGD5 0743-7463 25, 2378 (2009) 10.1021/la801601g
33. E. L. Prociow, J. Domaradzki, A. Podhorodecki, A. Borkowska, D. Kaczmarek, and J. Misiewicz, Thin Solid Films THSFAP 0040-6090 515, 6344 (2007). 10.1016/j.tsf.2006.11.082 (Pubitemid 46660890)
34. P. Mohanty, B. Kim, and J. Park, Mater. Sci. Eng., B MSBTEK 0921-5107 138, 224 (2007). 10.1016/j.mseb.2007.01.007 (Pubitemid 46453462)
35. E. -J. Cho and S. -J. Oh, Phys. Rev. B PRBMDO 0163-1829 59, R15613 (1999). 10.1103/PhysRevB.59.R15613
36. E. -J. Cho, S. -J. Oh, S. Imada, S. Suga, T. Suzuki, and T. Kasuya, Phys. Rev. B PRBMDO 0163-1829 51, 10146 (1995). 10.1103/PhysRevB.51.10146
37. L. Armelao, G. Bottaro, M. Pascolini, M. Sessolo, E. Tondello, M. Bettinelli, and A. Speghini, J. Phys. Chem. C JPCCCK 1932-7447 112, 4049 (2008). 10.1021/jp710207r
38. J. Petersen, C. Brimont, M. Gallart, O. Cŕgut, G. Schmerber, P. Gilliot, B. Hönerlage, C. Ulhaq-Bouillet, J. L. Rehspringer, C. Leuvrey, S. Colis, H. Aubriet, C. Becker, D. Ruch, A. Slaoui, and A. Dinia, J. Appl. Phys. JAPIAU 0021-8979 104, 113539 (2008) 10.1063/1.3021358
39. J. Petersen, C. Brimont, M. Gallart, O. Cŕgut, G. Schmerber, P. Gilliot, B. Hönerlage, C. Ulhaq-Bouillet, J. L. Rehspringer, C. Leuvrey, S. Colis, A. Slaoui, and A. Dinia, Microelectron. J. MICEB9 0026-2692 40, 239 (2009). 10.1016/j.mejo.2008.07.061
40. V. G. Pol, R. Reisfeld, and A. Gedanken, Chem. Mater. CMATEX 0897-4756 14, 3920 (2002). 10.1021/cm0203464
41. W. Chen, J. O. Malm, V. Zwiller, Y. Huang, S. Liu, R. Wallenberg, J. O. Bovin, and L. Samuelson, Phys. Rev. B PRBMDO 0163-1829 61, 11021 (2000). 10.1103/PhysRevB.61.11021
42. L. Li, H. K. Yang, B. K. Moon, Z. Fu, C. Guo, J. H. Jeong, S. S. Yi, K. Jang, and H. S. Lee, J. Phys. Chem. C JPCCCK 1932-7447 113, 610 (2009). 10.1021/jp808688w
43. M. Peres, A. Cruz, S. Pereira, M. R. Correia, M. J. Soares, A. Neves, M. C. Carmo, T. Monteiro, A. S. Pereira, M. A. Martins, T. Trindade, E. Alves, S. S. Nobre, and R. A. Sá Ferreira, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 88, 129 (2007). 10.1007/s00339-007-3941-9 (Pubitemid 46753809)