Spray deposition of CuInS2 on electrodeposited ZnO for low-cost solar cells

Surface and Coatings Technology

Volumn 204, Issue 24, 2010, Pages 3995-4000

  Valdes M H ^a   Berruet, M ^a   Goossens, A ^b   Vazquez M ^a  

^a UNIVERSIDAD NACIONAL DE MAR DEL PLATA   (Argentina)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

CuInS2; Electrodeposition; Nanostructured solar cells; Spray pyrolysis; ZnO

Indexed keywords

BAND-GAP VALUES; CARRIER DENSITY; CHEMICAL SPRAY PYROLYSIS; CIS FILM; CONDUCTIVE GLASS; DOUBLE LAYERS; FLAT BAND POTENTIAL; I - V CURVE; LOW-COST SOLAR CELLS; MOTT-SCHOTTKY PLOTS; NANOSTRUCTURED SOLAR CELLS; OPEN CIRCUIT POTENTIAL; RECTIFICATION RATIO; SEM; SPRAY DEPOSITION; TIO; XRD; ZNO; ZNO FILMS; ZNO LAYERS;

CRACKING (CHEMICAL); DISSOLUTION; ELECTRODEPOSITION; SOLAR CELLS; ZINC OXIDE;

SPRAY PYROLYSIS;

EID: 77954177561     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.05.028     Document Type: Article

References (42)

1. Aberle A.G. Thin Solid Films 2009, 517:4706.
2. Britt J., Ferekides C. Appl. Phys. Lett. 1993, 62:2851.
3. Aramoto T., Kumazawa S., Higuchi H., Arita T., Shibutani S., Nishio T., Nakajima J., Tsuji M., Hanafusa A., Hibino T., Omura K., Ohyama H., Murozono M. Jpn. J. App. Phys. 1997, 1(36):6304.
4. Mathew X., Enriquez J.P., Romeo A., Tiwari A.N. Sol. Energy 2004, 77:831.
5. Bosio A., Romeo N., Mazzamuto S., Canevari V. Prog. Crys. Growth Ch. 2006, 52:247.
6. Negami T., Hashimoto Y., Nishiwaki S. Sol. Energy Mater. Sol Cells 2001, 67:331.
7. Repins I., Contreras M.A., Egaas B., DeHart C., Scharf J., Perkins C.L., To B., Noufi R. Prog. Photovoltaics 2008, 16:235.
8. Lee S.-Y., Park B.-O. Thin Solid Films 2008, 516:3862.
9. Oja I., Nanu M., Katerski A., Krunks M., Mere A., Raudoja J., Goossens A. Thin Solid Films 2005, 480-481:82.
10. Krunks M., Mikli V., Bijakina O., Rebane H., Mere A., Varema T., Mellikov E. Thin Solid Films 2000, 361:61.
11. Yu C., Yu J.C., Wen H., Zhang C. Mater. Lett. 2009, 63:1984.
12. O'Regan B., Grätzel M. Nature 1991, 353:737.
13. Nanu M., Reijnen L., Meester B., Goossens A., Schoonman J. Thin Solid Films 2003, 431-432:492.
14. Nanu M., Reijnen L., Meester B., Schoonman J., Goossens A. Chem. Vap. Deposition 2004, 10:45.
15. Nanu M., Schoonman J., Goossens A. Nano Lett. 2005, 5:1716.
16. Krunks M., Katerski A., Dedova T., Oja Acik I., Mere A. Sol. Energy Mat. Sol. Cells 2008, 92:1016.
17. John T.T., Mathew M., Kartha C.S., Vijayakumar K.P., Abe T., Kashiwaba Y. Sol. Energy Mater. Sol. Cells 2005, 89:27.
18. Goossens A., Hofhuis J. Nanotechnol. 2008, 19:424018.
19. Mellikov E., Altosaar M., Krunks M., Krustok J., Varema T., Volobujeva O., Grossberg M., Kaupmees L., Dedova T., Timmo K., Ernits K., Kois J., Acik I.O., Danilson M., Bereznev S. Thin Solid Films 2008, 516:7125.
20. Lincot D., Guillemoles J.F., Taunier S., Guimard D., Sicx-Kurdi J., Chaumont A., Roussel O., Ramdani O., Hubert C., Fauvarque J.P. Sol. Energy 2004, 77:725.
21. Izaki M., Watase S., Takahashi H. Adv. Mater. 2003, 15:2000.
22. Marotti R.E., Guerra D.N., Bello C., Machado G., Dalchiele E.A. Sol. Energy Mater. Sol. Cells 2004, 82:85.
23. Goux A., Pauporté T., Chivot J., Lincot D. Electrochim. Acta 2005, 50:2239.
24. Gal D., Hodes G., Lincot D., Schock H.W. Thin Solid Films 2000, 361:79.
25. Dierstein A., Natter H., Meyer F., Stephan H.O., Kropf C., Hempelmann R. Scr. Mater. 2001, 44:2209.
26. O'Regan B., Sklover V., Grätzel M. J. Electrochem. Soc. 2001, 148:C498.
27. Chen Z., Tang Y., Zhang L., Luo L. Electrochim. Acta 2006, 51:5870.
28. Oja Acik I., Katerski A., Mere A., Aarik J., Aidla A., Dedova T., Krunks M. Thin Solid Films 2009, 517:2443.
29. Valdés M., Vázquez M., Goossens A. Electrochim. Acta 2008, 54:524.
30. Lokhande C.D., Hodes G. Sol. Cells 1987, 21:215.
31. Ogawa Y., Jäger-Waldau A., Hua T.H., Hashimoto Y., Ito K. App. Surf. Sci. 1996, 92:232.
32. International Centre for Difraction Data (ICCD) Powder Difraction File Database Newtown Square 1998, EEUU.
33. CRC Handbook of Chemistry and Physics Boca Raton 1987, (Florida). R.C. Weast (Ed.).
34. Wellings J.S., Chaure N.B., Heavens S.N., Dharmadasa I.M. Thin Solid Films 2008, 516:3893.
35. Zhang L., Chen Z., Tang Y., Jia Z. Thin Solid Films 2005, 492:24.
36. Yoshida T., Komatsu D., Shimokawa N., Minoura H. Thin Solid Films 2004, 451-452:166.
37. Krunks M., Bijakina O., Varema T., Mikli V., Mellikov E. Thin Solid Films 1999, 338:125.
38. Shirakata S., Terasako T., Kariya T. J. Phys. Chem. Solids 2005, 66:1970.
39. Van De Krol R., Goossens A., Schoonman J. J. Electrochem. Soc. 1997, 144:1723.
40. Liu H., Piret G., Sieber B., Laureyns J., Roussel P., Xu W., Boukherroub R., Szunerits S. Electrochem. Commun. 2009, 11:945.
41. O'Hayre R., Nanu M., Schoonman J., Goossens A., Phys J. Chem. C 2007, 111:4809.
42. Loef R., Schoonman J., Goossens A. J. App. Phys. 2007, 102:024512.