Electrical investigation of transparent thin films based on TiO2 doped with palladium and vanadium

2009 International Students and Young Scientists Workshop "Photonics and Microsystems"

Volumn , Issue , 2009, Pages 72-76

  Sieradzka, Karolina ^a   Prociow, Eugeniusz L ^a   Domaradzki, Jaroslaw ^a   Mazur, Michal ^a   Kaczmarek, Danuta ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ARCHITECTURAL GLASS; DOPED-TIO; ELECTRICAL CONDUCTION; ELECTRICAL MEASUREMENT; ELECTRICAL PARAMETER; HIGH TRANSPARENCY; LOW RESISTIVITY; MAGNETRON-SPUTTERING DEPOSITION; MATRIX; OPTICAL ABSORPTION; P-TYPE; POTENTIAL APPLICATIONS; ROOM TEMPERATURE; SEMI-CONDUCTING PROPERTY; SEMICONDUCTING OXIDE; SILICON SUBSTRATES; SMART COATINGS; THIN OXIDE FILMS; TIO; TRANSPARENT ELECTRONICS; TRANSPARENT THIN FILM; V-DOPING;

DEPOSITION; FLAT PANEL DISPLAYS; MICROSYSTEMS; OXIDE FILMS; PALLADIUM; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; THIN FILMS; TRANSPARENCY; VANADIUM; VAPOR DEPOSITION;

OPTICAL FILMS;

EID: 77954132276     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/STYSW.2009.5470299     Document Type: Conference Paper

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