Effect of buffer layer on VO x film fabrication by reactive RF sputtering

Applied Surface Science

Volumn 252, Issue 23, 2006, Pages 8367-8370

  Miyazaki, H ^a   Yasui, I ^b  

^a SHIMANE UNIVERSITY   (Japan)

^b UNITED NATIONS UNIVERSITY   (Japan)

Author keywords

Buffer layer; Sputtering; Thermochromism; Vanadium dioxide

Indexed keywords

FUSED SILICA; MAGNETRON SPUTTERING; REACTION KINETICS; SUBSTRATES; SUPERCONDUCTING TRANSITION TEMPERATURE; THERMAL EFFECTS; VANADIUM COMPOUNDS;

BUFFER LAYERS; NON-REACTIVE SPUTTERING; THERMOCHROMISMS; VANADIUM DIOXIDE;

THIN FILMS;

EID: 33748190704     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.11.040     Document Type: Article

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