Tailoring silica nanotribology for CMP slurry optimization: Ca2+ cation competition in C12TAB mediated lubrication

ACS Applied Materials and Interfaces

Volumn 2, Issue 4, 2010, Pages 1228-1235

  Vakarelski, Ivan U ^a,b   Brown, Scott C ^a   Basim, G Bahar ^a,c   Rabinovich, Yakov I ^a   Moudgil, Brij M ^a  

^a University of Florida   (United States)

^b INSTITUTE OF CHEMICAL AND ENGINEERING SCIENCES   (Singapore)

^c OZYEGIN UNIVERSITY   (Turkey)

Author keywords

Atomic force microscopy (AFM); Chemical mechanical planarization (CMP); Surfactants; Tribology

Indexed keywords

AQUEOUS ENVIRONMENT; AQUEOUS LUBRICATION; BOUNDARY LUBRICATIONS; CALCIUM CATIONS; CHARACTERIZATION METHODS; CHEMICAL MECHANICAL PLANARIZATION (CMP); CHEMICAL-MECHANICAL PLANARIZATION; CMP SLURRY; DISPERSANTS; DISPERSION STABILITY; FRICTION AND WEAR; LOW LEVEL; MATERIAL REMOVAL; NANO PARTICULATES; POLISHING SLURRIES; SELF-ASSEMBLED; SELF-HEALING; SILICA SURFACE; SOLID/LIQUID INTERFACES; SURFACE ADSORPTION; SURFACE AFFINITY; SURFACTANT STRUCTURE; TRIBOLOGICAL SYSTEMS;

ADSORPTION; ATOMIC FORCE MICROSCOPY; CALCIUM; CHEMICAL MECHANICAL POLISHING; FRICTION; POLISHING; POSITIVE IONS; SCANNING ELECTRON MICROSCOPY; SILICA; SLURRIES; SURFACE ACTIVE AGENTS; SURFACES; TRIBOLOGY;

ATOMS;

CALCIUM; CATION; CETRIMIDE; SILICON DIOXIDE; SURFACTANT;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; BINDING SITE; CHEMISTRY; MECHANICAL STRESS; METHODOLOGY; PH; PRESSURE; SCANNING ELECTRON MICROSCOPY; STATIC ELECTRICITY; SURFACE PROPERTY;

ADSORPTION; BINDING SITES; CALCIUM; CATIONS; CETRIMONIUM COMPOUNDS; HYDROGEN-ION CONCENTRATION; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; PRESSURE; SILICON DIOXIDE; STATIC ELECTRICITY; STRESS, MECHANICAL; SURFACE PROPERTIES; SURFACE-ACTIVE AGENTS;

EID: 77953688421     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100070e     Document Type: Article

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