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Journal of Applied Physics

Volumn 107, Issue 11, 2010, Pages

Influence of CH4 on the morphology of nanocrystalline diamond films deposited by Ar rich microwave plasma

(5) Rakha, Sobia Allah a Yu, Guojun b Cao, Jianqing b He, Suixia b Zhou, Xingtai b

a QUAID I AZAM UNIVERSITY (Pakistan)

b SHANGHAI INSTITUTE OF APPLIED PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION OF; DIAMOND NANORODS; FEED GAS; GRAPHITE CONTENT; HIGH CONCENTRATION; METHANE CONCENTRATIONS; MICROWAVE PLASMA; NANOCRYSTALLINE DIAMOND FILMS; NITROGEN CONCENTRATIONS; PROCESS GAS; REACTANT GAS;

ARGON; CONCENTRATION (PROCESS); DIAMONDS; METHANATION; METHANE; MICROWAVES; MORPHOLOGY; NANOCRYSTALLITES; NANORODS; NITROGEN; NITROGEN PLASMA; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

DIAMOND FILMS;

EID: 77953643799 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3410804 Document Type: Article

Times cited : (18)

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