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Journal of Applied Physics

Volumn 107, Issue 11, 2010, Pages

Semipolar r-plane ZnO films on Si(100) substrates: Thin film epitaxy and optical properties

(5) Aggarwal, Ravi a Zhou, Honghui a Jin, Chunming b Narayan, J a Narayan, Roger J a,b

a North Carolina State University (United States)

b Biomedical Research Imaging Center (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL FREE ENERGY; CRYSTALLOGRAPHIC ORIENTATIONS; HETEROEPITAXIAL GROWTH; HIGH OXYGEN PRESSURE; IN-PLANE; OPTICAL CHARACTERIZATION; OXYGEN PRESSURE; SEMIPOLAR; SI (100) SUBSTRATE; THIN FILM EPITAXY; ZNO; ZNO FILMS;

EPITAXIAL GROWTH; METALLIC FILMS; OPTICAL PROPERTIES; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; YTTRIA STABILIZED ZIRCONIA; ZINC OXIDE; ZIRCONIA;

OPTICAL FILMS;

EID: 77953625876 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3406260 Document Type: Article

Times cited : (23)

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