Fabrication of nanopatterns using block copolymer and controlling surface morphology

Journal of Colloid and Interface Science

Volumn 348, Issue 1, 2010, Pages 206-210

  Mahbub Alam, Md ^a   Lee, Yu Rim ^a   Kim, Jin Yeol ^a   Jung, Woo Gwang ^a  

^a Kookmin University   (South Korea)

Author keywords

Block copolymer; Degradation; Fingerprint pattern; Nanopattern; Sonication; Thickness

Indexed keywords

CYLINDRICAL DOMAIN; FINGERPRINT PATTERN; INTERSTITIAL SPACE; MICRO-DOMAINS; NANO PATTERN; NANO SCALE; POLYMER LAYERS; POLYMER SURFACES; SEM; SMALL SIZE;

ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; COPOLYMERIZATION; DEGRADATION; MORPHOLOGY; POLYMER FILMS; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; SONICATION; SUBSTRATES; ULTRAVIOLET RADIATION;

SURFACE MORPHOLOGY;

ACETIC ACID; COPOLYMER; POLYSTYRENE B POLYMETHYLMETHACRYLATE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; NANOANALYSIS; PHOTODEGRADATION; PRIORITY JOURNAL; RADIATION EXPOSURE; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; THICKNESS; ULTRAVIOLET RADIATION;

EID: 77953614560     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2010.04.039     Document Type: Article

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