Fabrication and characterization of high aspect ratio perpendicular patterned information storage media in an Al2O3/GaAs substrate

Journal of Applied Physics

Volumn 85, Issue 8 II B, 1999, Pages 5489-5491

  Wong, Joyce ^a   Scherer, Axel ^a   Todorovic, Mladen ^b   Schultz, Sheldon ^b  

^a California Institute of Technology   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; ETCHING; MAGNETIZATION; MAGNETORESISTANCE; MASKS; MOLECULAR BEAM EPITAXY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM COMPOUNDS; SUBSTRATES;

MAGNETIC FORCE MICROSCOPY; SCANNING MAGNETO-RESISTANCE MICROSCOPY;

MAGNETIC STORAGE;

EID: 0032613530     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369871     Document Type: Article

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