Reaction kinetics of Non-reciprocal Photo-Base Generator (NRPBG) patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Shykind, D ^a   Bristol, R ^a   Roberts, J ^a   Blackwell, J ^a   Borodovsky, Y ^a  

^a INTEL CORPORATION   (United States)

Author keywords

193nm; acid contrast; ArF; double exposure; latent image; LLE; non reciprocal; photobase; pitch division

Indexed keywords

ARF; DOUBLE EXPOSURE; INTERNATIONAL SOCIETY; KINETICS SIMULATIONS; LATENT IMAGES; LITHOGRAPHIC PATTERNING; MULTISTEP REACTIONS; RATE ANALYSIS; SIMPLE REACTION;

ACIDS; ASSOCIATION REACTIONS; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; RATE CONSTANTS;

REACTION KINETICS;

EID: 77953481414     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846990     Document Type: Conference Paper

References (10)

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5. (b) "Double-Exposure Materials for Pitch Division with 193nm Lithography: Requirements, Results", Robert Bristol, David Shykind, Sungwon Kim, Yan Borodovsky, Evan Schwartz, Courtney Turner, Georgeta Masson2, Ke Min, Katherine Esswein, James M. Blackwell, Nikolay Suetin, Proc. SPIE , 7273 727307, 2009.
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9. K. Min, K. Esswein, G. Masson, J. Blackwell, R. Bristol, J. Roberts, D. Shykind, E. Jackson, S. Garrat, A. Sundaresan, N. Turro, P. Billone, J. C. Scaiano, S. P. George, J. S. Figueroa, P. Zimmerman, "Synthesis and Photochemistry Study of Anthracenyl Photoswitches for 193-nm Double-Exposure Lithography Applications," to be published in Proceedings of the SPIE - The International Society for Optical Engineering, 2010, presentation number 7639-47
10. Robert Bristol, Jeanette Roberts, David Shykind, James M. Blackwell, "Non-reciprocal Double-exposure materials for 193nm pitch division", to be published in the Proceedings of the SPIE - The International Society for Optical Engineering,2010 presentation number 7639-4.