Non-reciprocal double-exposure materials for 193nm pitch division

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Bristol, Robert ^a   Roberts, Jeanette ^a   Shykind, David ^a   Blackwell, James M ^a  

^a INTEL CORPORATION   (United States)

Author keywords

193nm; ArF; double exposure; LLE; non reciprocal; pitch division

Indexed keywords

AERIAL IMAGES; ALL-AT-ONCE; BRIDGING DEFECTS; DOUBLE EXPOSURE; NONRECIPROCITY; PHOTOACID GENERATORS; PHOTOBASE GENERATOR; PHOTOPRODUCTS; PHOTORESPONSES; REACTION PATHWAYS; SHIFT-AND; THERMAL STABILITY; TWO STAGE;

CHUCKS; PHOTONS; PHOTORESISTORS; PHOTORESISTS; REACTION KINETICS;

MATERIALS;

EID: 77953497159     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846988     Document Type: Conference Paper

References (9)

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2. R. Bristol, D. Shykind, S. Kim, Y. Borodovsky, E. Schwartz, C. Turner, G. Masson, K. Min, K. Esswein, J. M. Blackwell, and N. Suetin, "Double-exposure materials for pitch division with 193nm lithography: requirements, results ," Proceedings of the SPIE - The International Society for Optical Engineering, vol. 7273, 2009.
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4. Lee, S., Byers, J., Jen, K., Zimmerman, P., Rice, B.J., Turro, N.J., Willson, C.G., "An analysis of double exposure lithography options," Proc. SPIE V 6924, 69242A-4 (2008).
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7. Naphtali A. O'Connor, Adam J. Berro, Jeffrey R. Lancaster, Xinyu Gu, Steffen Jockusch, Tomoki Nagai, Toshiyuki Ogata, Saul Lee, Paul Zimmerman, C. Grant Willson and Nicholas J. Turro, Chem. Matr., 20 pp7365-7524, (2008).
8. K. Min, K. Esswein, G. Masson, J. Blackwell, R. Bristol, J. Roberts, D. Shykind, E. Jackson, S. Garrat, A. Sundaresan, N. Turro, P. Billone, J. C. Scaiano, S. P. George, J. S. Figueroa, P. Zimmerman, "Synthesis and Photochemistry Study of Anthracenyl Photoswitches for 193-nm Double-Exposure Lithography Applications," to be published Proceedings of the SPIE - The International Society for Optical Engineering, 2010.
9. D. Shykind, R. Bristol, J. Roberts, J. Blackwell, and Y. Borodovsky, "Reaction Kinetics of Non-reciprocal Photo-Base Generator (NRPBG) Patterning," to be published Proceedings of the SPIE - The International Society for Optical Engineering, 2010.