Development progress of optics for EUVL at Nikon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Murakami, Katsuhiko ^a   Oshino, Tetsuya ^a   Kondo, Hiroyuki ^a   Shiraishi, Masayuki ^a   Chiba, Hiroshi ^a   Komatsuda, Hideki ^a   Nomura, Kazushi ^a   Nishikawa, Jin ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Aspheric mirrors; EUVL; Illumination optics; Multilayer coatings; Projection optics

Indexed keywords

ASPHERIC MIRRORS; EUVL; ILLUMINATION OPTICS; MULTILAYER COATINGS; PROJECTION OPTICS;

MIRRORS; MULTILAYERS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149142164     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813638     Document Type: Conference Paper

References (6)

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