Nikon EUVL development progress update

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Miura, Takaharu ^a   Murakami, Katsuhiko ^a   Kawai, Hidemi ^a   Kohama, Yoshiaki ^a   Morita, Kenji ^a   Hada, Kazunari ^a   Ohkubo, Yukiharu ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Euv exposure tool; EUVL; Extreme ultra violet lithography; Projection optics

Indexed keywords

CARBON DEPOSITION; COHERENCE FACTORS; CONTAMINATION CONTROL; EUV EXPOSURE TOOL; EUVL; EXPOSURE TOOL; FULL-FIELD; FULLY INTEGRATED; HIGH NA; IMAGING CAPABILITIES; METAL OXIDES; NUMERICAL APERTURE; OXYGEN INJECTION; PROJECTION OPTICS; WAVEFRONT ERRORS;

EXPOSURE METERS; MASKS; METALLIC COMPOUNDS; OXYGEN; SCANNING; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149087380     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813384     Document Type: Conference Paper

References (3)

1. T. Miura, K. Murakami, K. Suzuki, Y. KOhama, K. Morita, K. Hada, Y. Ohkubo and H. Kawai, "Nikon EUVL development progress update", Proc. SPIE 6921, 69210M (2008).
2. K. Murakami, T. Oshino, H. Kondo, H. Chiba, H. Komatusda, K. Noumura and H. Iwata, "Development status of projection optics and illumination optics for EUV1", Proc. SPIE 6921, 69210Q (2008)
3. I. Mori, O. Suga, H. Tanaka, I. Nishiyama, T. Terasawa, H. Shigemura, T. Taguchi, T. Tanaka and T. Itani, "Selete's EUV program: progress and challenges", Proc. SPIE 6921, 692102 (2008).