Treatment of nanocrystalline diamond films by nitrogen implantation using PIII processing

Surface and Coatings Technology

Volumn 204, Issue 18-19, 2010, Pages 3034-3038

  Miranda, C R B ^a   Ueda, M ^b   Baldan, M R ^b   Beloto, A F ^b   Ferreira, N G ^b  

^a CCST/INPE   (Brazil)

^b CTE/INPE   (Brazil)

Author keywords

Diamond; Electrochemical properties; Ion implantation technology

Indexed keywords

BEFORE AND AFTER; CVD PROCESS; ELECTRICAL CONDUCTIVITY; ELECTROCHEMICAL RESPONSE; ELECTRON TRANSFER KINETICS; FILM SURFACE MORPHOLOGY; HIGH-RESOLUTION X-RAY DIFFRACTION; HOT-FILAMENT REACTORS; NANOCRYSTALLINE DIAMOND FILMS; NCD FILMS; NITROGEN IMPLANTATION; NITROGEN INCORPORATION; PLASMA IMMERSION; PLASMA IMMERSION ION IMPLANTATION; PLASMA IMPLANTATION; PLASMA TREATMENT; RAMAN BANDS; RAMAN SCATTERING SPECTROSCOPY; RAMAN SPECTRA; SEM; SILICON SUBSTRATES;

DIAMONDS; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL PROPERTIES; HIGH RESOLUTION ELECTRON MICROSCOPY; ION IMPLANTATION; MORPHOLOGY; NANOCRYSTALLINE SILICON; NITROGEN; NITROGEN PLASMA; PLASMA APPLICATIONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DIAMOND FILMS;

EID: 77953355931     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.051     Document Type: Article

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